Dewetting inhibition and interfacial structures of silsesquioxane- terminated polystyrene thin films

Kyota Miyamoto, Nao Hosaka, Motoyasu Kobayashi, Hideyuki Otsuka, Norifumi Yamada, Naoya Torikai, Atsushi Takahara

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Polyhedral oligomeric silsesquioxane (POSS)-terminated polystyrene (PS-POSS) was prepared by nitroxide-mediated radical polymerization of styrene with POSS-containing initiator, and the thermal stability of PS-POSS thin films was investigated. Rheological measurement of PS-POSS revealed that the rheological properties were profoundly affected by the presence of POSS end groups in low molecular weight region (Mn ≈ 2000), while those were nearly unaffected in high molecular weight region (Mn ≈ 40000). However, the introduction of POSS as a PS end group can actually stabilize PS thin films against de wetting in a range of the molecular weight used in this study. Neutron reflectivity measurement of deuterated PS-POSS thin film revealed that the POSS moieties Of PS-POSS formed enrichment layer at the interfaces of the film. The segregation of the POSS end group at the film-substrate interface, which can modify the interface by tethering the PS chains at the interface, seems to be an important factor in the dewetting inhibition effect.

Original languageEnglish
Pages (from-to)1247-1252
Number of pages6
JournalPolymer Journal
Volume39
Issue number12
DOIs
Publication statusPublished - Dec 1 2007

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Polystyrenes
Molecular weight
Thin films
Styrene
Free radical polymerization
Wetting
Neutrons
Thermodynamic stability
Substrates

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Dewetting inhibition and interfacial structures of silsesquioxane- terminated polystyrene thin films. / Miyamoto, Kyota; Hosaka, Nao; Kobayashi, Motoyasu; Otsuka, Hideyuki; Yamada, Norifumi; Torikai, Naoya; Takahara, Atsushi.

In: Polymer Journal, Vol. 39, No. 12, 01.12.2007, p. 1247-1252.

Research output: Contribution to journalArticle

Miyamoto, K, Hosaka, N, Kobayashi, M, Otsuka, H, Yamada, N, Torikai, N & Takahara, A 2007, 'Dewetting inhibition and interfacial structures of silsesquioxane- terminated polystyrene thin films', Polymer Journal, vol. 39, no. 12, pp. 1247-1252. https://doi.org/10.1295/polymj.PJ2007067
Miyamoto K, Hosaka N, Kobayashi M, Otsuka H, Yamada N, Torikai N et al. Dewetting inhibition and interfacial structures of silsesquioxane- terminated polystyrene thin films. Polymer Journal. 2007 Dec 1;39(12):1247-1252. https://doi.org/10.1295/polymj.PJ2007067
Miyamoto, Kyota ; Hosaka, Nao ; Kobayashi, Motoyasu ; Otsuka, Hideyuki ; Yamada, Norifumi ; Torikai, Naoya ; Takahara, Atsushi. / Dewetting inhibition and interfacial structures of silsesquioxane- terminated polystyrene thin films. In: Polymer Journal. 2007 ; Vol. 39, No. 12. pp. 1247-1252.
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