Dewetting inhibition and interfacial structures of silsesquioxane- terminated polystyrene thin films

Kyota Miyamoto, Nao Hosaka, Motoyasu Kobayashi, Hideyuki Otsuka, Norifumi Yamada, Naoya Torikai, Atsushi Takahara

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Polyhedral oligomeric silsesquioxane (POSS)-terminated polystyrene (PS-POSS) was prepared by nitroxide-mediated radical polymerization of styrene with POSS-containing initiator, and the thermal stability of PS-POSS thin films was investigated. Rheological measurement of PS-POSS revealed that the rheological properties were profoundly affected by the presence of POSS end groups in low molecular weight region (Mn ≈ 2000), while those were nearly unaffected in high molecular weight region (Mn ≈ 40000). However, the introduction of POSS as a PS end group can actually stabilize PS thin films against de wetting in a range of the molecular weight used in this study. Neutron reflectivity measurement of deuterated PS-POSS thin film revealed that the POSS moieties Of PS-POSS formed enrichment layer at the interfaces of the film. The segregation of the POSS end group at the film-substrate interface, which can modify the interface by tethering the PS chains at the interface, seems to be an important factor in the dewetting inhibition effect.

Original languageEnglish
Pages (from-to)1247-1252
Number of pages6
JournalPolymer Journal
Volume39
Issue number12
DOIs
Publication statusPublished - Dec 1 2007

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

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