Abstract
A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.
| Original language | English |
|---|---|
| Title of host publication | 54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan |
| Pages | 3299-3300 |
| Number of pages | 2 |
| Volume | 54 |
| Edition | 2 |
| Publication status | Published - 2005 |
| Event | 54th SPSJ Symposium on Macromolecules - Yamagata, Japan Duration: Sep 20 2005 → Sep 22 2005 |
Other
| Other | 54th SPSJ Symposium on Macromolecules |
|---|---|
| Country | Japan |
| City | Yamagata |
| Period | 9/20/05 → 9/22/05 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
Cite this
Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene. / Miyamoto, Kyota; Hosaka, Nao; Otsuka, Hideyuki; Takahara, Atsushi.
54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan. Vol. 54 2. ed. 2005. p. 3299-3300.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene
AU - Miyamoto, Kyota
AU - Hosaka, Nao
AU - Otsuka, Hideyuki
AU - Takahara, Atsushi
PY - 2005
Y1 - 2005
N2 - A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.
AB - A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.
UR - http://www.scopus.com/inward/record.url?scp=33645576100&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33645576100&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:33645576100
VL - 54
SP - 3299
EP - 3300
BT - 54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan
ER -