Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene

Kyota Miyamoto; Nao Hosaka; Hideyuki Otsuka; Atsushi Takahara

Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene

Kyota Miyamoto, Nao Hosaka, Hideyuki Otsuka, Atsushi Takahara

Department of Applied Molecular Chemistry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (M_n=2500, M_w/M_n=1.11) was slightly higher than that of PS (M _n=2100, M_w/M_n=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.

Original language	English
Title of host publication	54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan
Pages	3299-3300
Number of pages	2
Volume	54
Edition	2
Publication status	Published - 2005
Event	54th SPSJ Symposium on Macromolecules - Yamagata, Japan Duration: Sep 20 2005 → Sep 22 2005

Other

Other	54th SPSJ Symposium on Macromolecules
Country/Territory	Japan
City	Yamagata
Period	9/20/05 → 9/22/05

All Science Journal Classification (ASJC) codes

Engineering(all)

Cite this

@inproceedings{d8d14c3309e145ec951fedc005e2d4b1,

title = "Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene",

abstract = "A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.",

author = "Kyota Miyamoto and Nao Hosaka and Hideyuki Otsuka and Atsushi Takahara",

year = "2005",

language = "English",

volume = "54",

pages = "3299--3300",

booktitle = "54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan",

edition = "2",

note = "54th SPSJ Symposium on Macromolecules ; Conference date: 20-09-2005 Through 22-09-2005",

}

TY - GEN

T1 - Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene

AU - Miyamoto, Kyota

AU - Hosaka, Nao

AU - Otsuka, Hideyuki

AU - Takahara, Atsushi

PY - 2005

Y1 - 2005

N2 - A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.

AB - A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.

UR - http://www.scopus.com/inward/record.url?scp=33645576100&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33645576100&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:33645576100

VL - 54

SP - 3299

EP - 3300

BT - 54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan

T2 - 54th SPSJ Symposium on Macromolecules

Y2 - 20 September 2005 through 22 September 2005

ER -

Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene

Abstract

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