Abstract
A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.
Original language | English |
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Title of host publication | 54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan |
Pages | 3299-3300 |
Number of pages | 2 |
Volume | 54 |
Edition | 2 |
Publication status | Published - 2005 |
Event | 54th SPSJ Symposium on Macromolecules - Yamagata, Japan Duration: Sep 20 2005 → Sep 22 2005 |
Other
Other | 54th SPSJ Symposium on Macromolecules |
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Country/Territory | Japan |
City | Yamagata |
Period | 9/20/05 → 9/22/05 |
All Science Journal Classification (ASJC) codes
- Engineering(all)