Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene

Kyota Miyamoto, Nao Hosaka, Hideyuki Otsuka, Atsushi Takahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.

Original languageEnglish
Title of host publication54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan
Pages3299-3300
Number of pages2
Volume54
Edition2
Publication statusPublished - 2005
Event54th SPSJ Symposium on Macromolecules - Yamagata, Japan
Duration: Sep 20 2005Sep 22 2005

Other

Other54th SPSJ Symposium on Macromolecules
CountryJapan
CityYamagata
Period9/20/059/22/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Miyamoto, K., Hosaka, N., Otsuka, H., & Takahara, A. (2005). Dewetting inhibition of polymer ultrathin films with addition of silsesquioxane-terminated polystyrene. In 54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan (2 ed., Vol. 54, pp. 3299-3300)