Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source

Daisuke Nakamura, K. Okazaki, T. Akiyama, K. Toya, Akihiko Takahashi, T. Okada, T. Yanagida, Y. Ueno, Y. Sasaki, T. Suganuma, M. Nakano, H. Komori, A. Sumitani, A. Endo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009
Publication statusPublished - Dec 1 2009
EventConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009 - Shanghai, China
Duration: Aug 30 2009Sep 3 2009

Other

OtherConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009
CountryChina
CityShanghai
Period8/30/099/3/09

Fingerprint

Extreme ultraviolet lithography
Ablation
Tin
ablation
Light sources
tin
light sources
lithography
shadowgraph photography
Imaging techniques
debris
Debris
laser induced fluorescence
Fluorescence
Lasers
pulses

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Nakamura, D., Okazaki, K., Akiyama, T., Toya, K., Takahashi, A., Okada, T., ... Endo, A. (2009). Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source. In Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009

Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source. / Nakamura, Daisuke; Okazaki, K.; Akiyama, T.; Toya, K.; Takahashi, Akihiko; Okada, T.; Yanagida, T.; Ueno, Y.; Sasaki, Y.; Suganuma, T.; Nakano, M.; Komori, H.; Sumitani, A.; Endo, A.

Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009. 2009.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nakamura, D, Okazaki, K, Akiyama, T, Toya, K, Takahashi, A, Okada, T, Yanagida, T, Ueno, Y, Sasaki, Y, Suganuma, T, Nakano, M, Komori, H, Sumitani, A & Endo, A 2009, Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source. in Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009. Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009, Shanghai, China, 8/30/09.
Nakamura D, Okazaki K, Akiyama T, Toya K, Takahashi A, Okada T et al. Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source. In Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009. 2009
Nakamura, Daisuke ; Okazaki, K. ; Akiyama, T. ; Toya, K. ; Takahashi, Akihiko ; Okada, T. ; Yanagida, T. ; Ueno, Y. ; Sasaki, Y. ; Suganuma, T. ; Nakano, M. ; Komori, H. ; Sumitani, A. ; Endo, A. / Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source. Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009. 2009.
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AU - Okazaki, K.

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AU - Takahashi, Akihiko

AU - Okada, T.

AU - Yanagida, T.

AU - Ueno, Y.

AU - Sasaki, Y.

AU - Suganuma, T.

AU - Nakano, M.

AU - Komori, H.

AU - Sumitani, A.

AU - Endo, A.

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