Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source

D. Nakamura, K. Okazaki, T. Akiyama, K. Toya, A. Takahashi, T. Okada, T. Yanagida, Y. Ueno, Y. Sasaki, T. Suganuma, M. Nakano, H. Komori, A. Sumitani, A. Endo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009
Publication statusPublished - Dec 1 2009
EventConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009 - Shanghai, China
Duration: Aug 30 2009Sep 3 2009

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherConference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009
CountryChina
CityShanghai
Period8/30/099/3/09

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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    Nakamura, D., Okazaki, K., Akiyama, T., Toya, K., Takahashi, A., Okada, T., Yanagida, T., Ueno, Y., Sasaki, Y., Suganuma, T., Nakano, M., Komori, H., Sumitani, A., & Endo, A. (2009). Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source. In Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2009 (Optics InfoBase Conference Papers).