Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source

D. Nakamura, K. Okazaki, T. Akiyama, K. Toya, A. Takahashi, T. Okada, T. Yanagida, Y. Ueno, Y. Sasaki, T. Suganuma, M. Nakano, H. Komori, A. Sumitani, A. Endo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.

Original languageEnglish
Title of host publicationCLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics
DOIs
Publication statusPublished - 2009
EventCLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics - Shanghai, China
Duration: Aug 30 2009Sep 3 2009

Publication series

NamePacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

Other

OtherCLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics
CountryChina
CityShanghai
Period8/30/099/3/09

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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    Nakamura, D., Okazaki, K., Akiyama, T., Toya, K., Takahashi, A., Okada, T., Yanagida, T., Ueno, Y., Sasaki, Y., Suganuma, T., Nakano, M., Komori, H., Sumitani, A., & Endo, A. (2009). Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source. In CLEO/Pacific Rim 2009 - 8th Pacific Rim Conference on Lasers and Electro-Optics [5292242] (Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest). https://doi.org/10.1109/CLEOPR.2009.5292242