Diamond/hydrogenated amorphous carbon composite films prepared by pulsed laser deposition

Sausan Al-Riyami, Hiroyuki Setoyama, Kazushi Sumitani, Yasuharu Hirai, Tsuyoshi Yoshitake

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    Nitrogenated ultrananocrystalline diamond/hydrogenated amorphous carbon composite films were prepared in a hydrogen and nitrogen mixed-gas atmosphere by pulsed laser deposition with graphite targets. The electrical conductivity in n-type conduction remarkably increases to 18 Ω-1-cm-1 at 300 K with an increase in the nitrogen content up to 7.9 at.%. In the nitrogen content range from 7.9 to 1i0.4 at.%, the electrical conductivity is suddenly and dramatically decreased down to 0.03 Ω-1 cm-1 in reverse, accompanied by the disappearance of diamond grains in the films. A huge number of grain boundaries owing to the existence of diamond grains embedded in UNCD/a-C:H films, which is structural specific to UNCD/a-C:H, should play a significant role in the large electrical conductivity enhancement by nitrogen doping. The X-ray photoemission and near-edge X-ray fine-absorption spectroscopic measurements could not detect an evident difference in the spectra that explain the sudden irregular change in the electrical conductivity.

    Original languageEnglish
    Title of host publicationNanotechnology (General) - 222nd ECS Meeting/PRiME 2012
    Pages41-47
    Number of pages7
    Edition22
    DOIs
    Publication statusPublished - 2012
    EventSymposium on Nanotechnology General Session - 222nd ECS Meeting/PRiME 2012 - Honolulu, HI, United States
    Duration: Oct 7 2012Oct 12 2012

    Publication series

    NameECS Transactions
    Number22
    Volume50
    ISSN (Print)1938-5862
    ISSN (Electronic)1938-6737

    Other

    OtherSymposium on Nanotechnology General Session - 222nd ECS Meeting/PRiME 2012
    CountryUnited States
    CityHonolulu, HI
    Period10/7/1210/12/12

    All Science Journal Classification (ASJC) codes

    • Engineering(all)

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