Diffusion behavior of sulfur in the p(1 × 1) phase of a S/Ni(111) system

S. Tsukawaki, Y. Hatano, Kenichi Hashizume, M. Sugisaki

    Research output: Contribution to journalArticle

    3 Citations (Scopus)

    Abstract

    The surface phase diagram of S/Ni(111) in the temperature range from room temperature to 900 K has been established by reflection high-energy electron diffraction observations in consultation with previously reported data. The temperature dependence of surface diffusion coefficient of sulfur in a p(1 × 1) phase was measured with micro probe Auger electron microscopy from 513 to 597 K. The diffusion coefficient in the p(1 × 1) phase in the coverage region from 0.05 to 0.10 ML is expressed as: D (cm2 s-1) = 2 × 103 exp[-1.1 ± 0.1 (eV)/kBT].

    Original languageEnglish
    Pages (from-to)63-70
    Number of pages8
    JournalSurface Science
    Volume457
    Issue number1
    DOIs
    Publication statusPublished - Jun 1 2000

    Fingerprint

    Sulfur
    sulfur
    diffusion coefficient
    surface diffusion
    high energy electrons
    electron microscopy
    Reflection high energy electron diffraction
    electron diffraction
    Surface diffusion
    phase diagrams
    Temperature
    temperature dependence
    Electron microscopy
    Phase diagrams
    probes
    room temperature
    temperature

    All Science Journal Classification (ASJC) codes

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

    Cite this

    Diffusion behavior of sulfur in the p(1 × 1) phase of a S/Ni(111) system. / Tsukawaki, S.; Hatano, Y.; Hashizume, Kenichi; Sugisaki, M.

    In: Surface Science, Vol. 457, No. 1, 01.06.2000, p. 63-70.

    Research output: Contribution to journalArticle

    Tsukawaki, S. ; Hatano, Y. ; Hashizume, Kenichi ; Sugisaki, M. / Diffusion behavior of sulfur in the p(1 × 1) phase of a S/Ni(111) system. In: Surface Science. 2000 ; Vol. 457, No. 1. pp. 63-70.
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