Diffusion dominated process for the crystal growth of a binary alloy

Wen Rui Hu, Akira Hirata, Shinichi Nishizawa

Research output: Contribution to journalArticle

Abstract

The pure diffusion process has been often used to study the crystal growth of a binary alloy in the microgravity environment. In the present paper, a geometric parameter, the ratio of the maximum deviation distance of curved solidification and melting interfaces from the plane to the radius of the crystal rod, was adopted as a small parameter, and the analytical solution was obtained based on the perturbation theory. The radial segregation of a diffusion dominated process was obtained for cases of arbitrary Peclet number in a region of finite extension with both a curved solidification interface and a curved melting interface. Two types of boundary conditions at the melting interface were analyzed. Some special cases such as infinite extension in the longitudinal direction and special range of Peclet number were reduced from the general solution and discussed in detail.

Original languageEnglish
Pages (from-to)380-392
Number of pages13
JournalJournal of Crystal Growth
Volume169
Issue number2
DOIs
Publication statusPublished - Nov 1 1996
Externally publishedYes

Fingerprint

Binary alloys
binary alloys
Crystallization
Crystal growth
crystal growth
Melting
Peclet number
Solidification
melting
solidification
Microgravity
microgravity
Boundary conditions
Crystals
rods
perturbation theory
boundary conditions
deviation
radii
crystals

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

Diffusion dominated process for the crystal growth of a binary alloy. / Hu, Wen Rui; Hirata, Akira; Nishizawa, Shinichi.

In: Journal of Crystal Growth, Vol. 169, No. 2, 01.11.1996, p. 380-392.

Research output: Contribution to journalArticle

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