Diffusion of Nb in Nb-H alloys

Yoshihiro Yamazaki, Takahiro Iida, Yoshiaki Iijima, Yuh Fukai

Research output: Contribution to journalArticle

Abstract

Self-diffusion coefficient of 95Nb in NbHx alloys (x=0.05, 0.25 and 0.3) has been determined in the temperature range from 823 to 1323 K by using a serial sputter-microsectioning technique. The self-diffusion coefficient of Nb in the NbHx alloys are larger than that in Nb, suggesting that vacancies are formed by hydrogen dissolution, that is, the formation of hydrogen-induced vacancies. The value of the pre-exponential factor for the Nb diffusion in the NbH0.05 alloy is five times larger than that in Nb, while the difference in the activation energies between the NbH 0.05 alloy and pure Nb is small. The self-diffusion enhancement in the NbH0.05 alloy is mainly caused by lowering in vibrational frequencies of atoms in the immediate neighborhood of hydrogen-induced vacancies.

Original languageEnglish
Pages (from-to)346-351
Number of pages6
JournalDefect and Diffusion Forum
Volume237-240
Issue numberPART 1
Publication statusPublished - Jan 1 2005
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Radiation
  • Materials Science(all)
  • Condensed Matter Physics

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    Yamazaki, Y., Iida, T., Iijima, Y., & Fukai, Y. (2005). Diffusion of Nb in Nb-H alloys. Defect and Diffusion Forum, 237-240(PART 1), 346-351.