Diffusional behavior of tritium in V-4Cr-4Ti alloy

K. Hashizume, J. Masuda, T. Otsuka, T. Tanabe, Y. Hatano, Y. Nakamura, T. Nagasaka, T. Muroga

    Research output: Contribution to journalArticle

    13 Citations (Scopus)

    Abstract

    Tritium diffusion behavior in a V-4Cr-4Ti (NIFS-Heat-2) alloy has been examined with a tritium tracer technique. Firstly, a small amount of tritium (T) was implanted into the specimen surface, and then the specimen was diffusion-annealed at temperatures ranging from 373 K to 573 K. The diffusion depth profile of T in the specimen was measured with a tritium imaging plate (IP) technique to determine the diffusion coefficient. The obtained diffusion coefficient of tritium in V-4Cr-4Ti is expressed asDt (cm2 / s) = (7.5 ± 0.2) × 10- 4 exp (- 0.13 (eV) / kT),which is lower than that in pure vanadium, and is comparable with literature values of protium in a V-4Ti alloy taking the isotope mass effect into consideration.

    Original languageEnglish
    Pages (from-to)876-881
    Number of pages6
    JournalJournal of Nuclear Materials
    Volume367-370 A
    Issue numberSPEC. ISS.
    DOIs
    Publication statusPublished - Aug 1 2007

    All Science Journal Classification (ASJC) codes

    • Nuclear and High Energy Physics
    • Materials Science(all)
    • Nuclear Energy and Engineering

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