Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor

Yasuhiko Tada, Hiroshi Yoshida, Yoshihito Ishida, Tomoyasu Hirai, Joan K. Bosworth, Elizabeth Dobisz, Ricardo Ruiz, Mikihito Takenaka, Teruaki Hayakawa, Hirokazu Hasegawa

Research output: Contribution to journalArticle

77 Citations (Scopus)

Abstract

Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm scale lithographic features. Here, we report directed self-assembly of polyhedral oligomeric silsesquioxane containing block copolymers (PMMA-b-PMAPOSS) with feature density multiplication to form long-range ordered arrays of dots having areal densities of ∼4 tera dots per square inch via controlled solvent annealing. The degree of swelling of PMMA-b-PMAPOSS thin film during the carbon disulfide solvent annealing was optimized to give the polymer chain mobility to form the desired microdomain structure. Because the annealing solvent is not fully neutral to the components of the BCP, the types of microstructures formed depend strongly on the degree of swelling. We demonstrated that the directed self-assembly with 4× density multiplication of the chemically patterned template can be performed successfully under the optimized condition of solvent annealing and hexagonally packed dots array with 12 nm lattice spacing was produced. We also showed that the microdomain structures formed by solvent-annealing the BCP on the chemically patterned template could tolerate several percent of mismatch between the lattice spacing of the BCP and that of the template. In this study the morphology was limited to hexagonally packed dots. However, the results strongly support the potential application of the technique to form 10 nm scale features of other desired geometries.

Original languageEnglish
Pages (from-to)292-304
Number of pages13
JournalMacromolecules
Volume45
Issue number1
DOIs
Publication statusPublished - Jan 10 2012

Fingerprint

Self assembly
Block copolymers
Vapors
Annealing
Polymethyl Methacrylate
Swelling
Carbon Disulfide
Carbon disulfide
Polymers
Thin films
Microstructure
Geometry

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor. / Tada, Yasuhiko; Yoshida, Hiroshi; Ishida, Yoshihito; Hirai, Tomoyasu; Bosworth, Joan K.; Dobisz, Elizabeth; Ruiz, Ricardo; Takenaka, Mikihito; Hayakawa, Teruaki; Hasegawa, Hirokazu.

In: Macromolecules, Vol. 45, No. 1, 10.01.2012, p. 292-304.

Research output: Contribution to journalArticle

Tada, Y, Yoshida, H, Ishida, Y, Hirai, T, Bosworth, JK, Dobisz, E, Ruiz, R, Takenaka, M, Hayakawa, T & Hasegawa, H 2012, 'Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor', Macromolecules, vol. 45, no. 1, pp. 292-304. https://doi.org/10.1021/ma201822a
Tada, Yasuhiko ; Yoshida, Hiroshi ; Ishida, Yoshihito ; Hirai, Tomoyasu ; Bosworth, Joan K. ; Dobisz, Elizabeth ; Ruiz, Ricardo ; Takenaka, Mikihito ; Hayakawa, Teruaki ; Hasegawa, Hirokazu. / Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor. In: Macromolecules. 2012 ; Vol. 45, No. 1. pp. 292-304.
@article{9d6ab3a07d934d01ac71045b8f17c8e5,
title = "Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor",
abstract = "Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm scale lithographic features. Here, we report directed self-assembly of polyhedral oligomeric silsesquioxane containing block copolymers (PMMA-b-PMAPOSS) with feature density multiplication to form long-range ordered arrays of dots having areal densities of ∼4 tera dots per square inch via controlled solvent annealing. The degree of swelling of PMMA-b-PMAPOSS thin film during the carbon disulfide solvent annealing was optimized to give the polymer chain mobility to form the desired microdomain structure. Because the annealing solvent is not fully neutral to the components of the BCP, the types of microstructures formed depend strongly on the degree of swelling. We demonstrated that the directed self-assembly with 4× density multiplication of the chemically patterned template can be performed successfully under the optimized condition of solvent annealing and hexagonally packed dots array with 12 nm lattice spacing was produced. We also showed that the microdomain structures formed by solvent-annealing the BCP on the chemically patterned template could tolerate several percent of mismatch between the lattice spacing of the BCP and that of the template. In this study the morphology was limited to hexagonally packed dots. However, the results strongly support the potential application of the technique to form 10 nm scale features of other desired geometries.",
author = "Yasuhiko Tada and Hiroshi Yoshida and Yoshihito Ishida and Tomoyasu Hirai and Bosworth, {Joan K.} and Elizabeth Dobisz and Ricardo Ruiz and Mikihito Takenaka and Teruaki Hayakawa and Hirokazu Hasegawa",
year = "2012",
month = "1",
day = "10",
doi = "10.1021/ma201822a",
language = "English",
volume = "45",
pages = "292--304",
journal = "Macromolecules",
issn = "0024-9297",
publisher = "American Chemical Society",
number = "1",

}

TY - JOUR

T1 - Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor

AU - Tada, Yasuhiko

AU - Yoshida, Hiroshi

AU - Ishida, Yoshihito

AU - Hirai, Tomoyasu

AU - Bosworth, Joan K.

AU - Dobisz, Elizabeth

AU - Ruiz, Ricardo

AU - Takenaka, Mikihito

AU - Hayakawa, Teruaki

AU - Hasegawa, Hirokazu

PY - 2012/1/10

Y1 - 2012/1/10

N2 - Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm scale lithographic features. Here, we report directed self-assembly of polyhedral oligomeric silsesquioxane containing block copolymers (PMMA-b-PMAPOSS) with feature density multiplication to form long-range ordered arrays of dots having areal densities of ∼4 tera dots per square inch via controlled solvent annealing. The degree of swelling of PMMA-b-PMAPOSS thin film during the carbon disulfide solvent annealing was optimized to give the polymer chain mobility to form the desired microdomain structure. Because the annealing solvent is not fully neutral to the components of the BCP, the types of microstructures formed depend strongly on the degree of swelling. We demonstrated that the directed self-assembly with 4× density multiplication of the chemically patterned template can be performed successfully under the optimized condition of solvent annealing and hexagonally packed dots array with 12 nm lattice spacing was produced. We also showed that the microdomain structures formed by solvent-annealing the BCP on the chemically patterned template could tolerate several percent of mismatch between the lattice spacing of the BCP and that of the template. In this study the morphology was limited to hexagonally packed dots. However, the results strongly support the potential application of the technique to form 10 nm scale features of other desired geometries.

AB - Strongly segregating block copolymers (BCPs) are attractive as a means of forming 10 nm scale lithographic features. Here, we report directed self-assembly of polyhedral oligomeric silsesquioxane containing block copolymers (PMMA-b-PMAPOSS) with feature density multiplication to form long-range ordered arrays of dots having areal densities of ∼4 tera dots per square inch via controlled solvent annealing. The degree of swelling of PMMA-b-PMAPOSS thin film during the carbon disulfide solvent annealing was optimized to give the polymer chain mobility to form the desired microdomain structure. Because the annealing solvent is not fully neutral to the components of the BCP, the types of microstructures formed depend strongly on the degree of swelling. We demonstrated that the directed self-assembly with 4× density multiplication of the chemically patterned template can be performed successfully under the optimized condition of solvent annealing and hexagonally packed dots array with 12 nm lattice spacing was produced. We also showed that the microdomain structures formed by solvent-annealing the BCP on the chemically patterned template could tolerate several percent of mismatch between the lattice spacing of the BCP and that of the template. In this study the morphology was limited to hexagonally packed dots. However, the results strongly support the potential application of the technique to form 10 nm scale features of other desired geometries.

UR - http://www.scopus.com/inward/record.url?scp=84855642858&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84855642858&partnerID=8YFLogxK

U2 - 10.1021/ma201822a

DO - 10.1021/ma201822a

M3 - Article

VL - 45

SP - 292

EP - 304

JO - Macromolecules

JF - Macromolecules

SN - 0024-9297

IS - 1

ER -