TY - JOUR
T1 - Discharge characteristics of DC arc water plasma for environmental applications
AU - Li, Tianming
AU - Choi, Sooseok
AU - Watanabe, Takayuki
N1 - Copyright:
Copyright 2013 Elsevier B.V., All rights reserved.
PY - 2012/12
Y1 - 2012/12
N2 - A water plasma was generated by DC arc discharge with a hafnium embedded rodtype cathode and a nozzle-type anode. The discharge characteristics were examined by changing the operation parameter of the arc current. The dynamic behavior of the arc discharge led to significant fluctuations in the arc voltage and its frequency. Analyses of the high speed image and the arc voltage waveform showed that the arc discharge was in the restrike mode and its frequency varied within several tens of kilohertz according to the operating conditions. The larger thermal plasma volume was generated by the higher flow from the forming steam with a higher restrike frequency in the higher arc current conditions. In addition, the characteristics of the water plasma jet were investigated by means of optical emission spectroscopy to identify the abundant radicals required in an efficient waste treatment process.
AB - A water plasma was generated by DC arc discharge with a hafnium embedded rodtype cathode and a nozzle-type anode. The discharge characteristics were examined by changing the operation parameter of the arc current. The dynamic behavior of the arc discharge led to significant fluctuations in the arc voltage and its frequency. Analyses of the high speed image and the arc voltage waveform showed that the arc discharge was in the restrike mode and its frequency varied within several tens of kilohertz according to the operating conditions. The larger thermal plasma volume was generated by the higher flow from the forming steam with a higher restrike frequency in the higher arc current conditions. In addition, the characteristics of the water plasma jet were investigated by means of optical emission spectroscopy to identify the abundant radicals required in an efficient waste treatment process.
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U2 - 10.1088/1009-0630/14/12/11
DO - 10.1088/1009-0630/14/12/11
M3 - Article
AN - SCOPUS:84871646553
SN - 1009-0630
VL - 14
SP - 1097
EP - 1101
JO - Plasma Science and Technology
JF - Plasma Science and Technology
IS - 12
ER -