Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films

Kyota Miyamoto, Nao Hosaka, Hideyuki Otsuka, Atsushi Takahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with polyhedral oligomeric silsesquioxane (POSS) at one end, were prepared by nitroxide-mediated radical polymerization. Blend films composed of PS-POSS and PS were spin-coated from their toluene solution onto cleaned silicon wafer. Atomic force microscopic observation suggested that PS-POSS was well dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin film served to improve the stability of the thin film against dewetting.

Original languageEnglish
Title of host publication54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
Pages1093
Number of pages1
Volume54
Edition1
Publication statusPublished - 2005
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: May 25 2005May 27 2005

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period5/25/055/27/05

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Polystyrenes
Thin films
Free radical polymerization
Silicon wafers
Toluene
Polymers

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Miyamoto, K., Hosaka, N., Otsuka, H., & Takahara, A. (2005). Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films. In 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan (1 ed., Vol. 54, pp. 1093)

Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films. / Miyamoto, Kyota; Hosaka, Nao; Otsuka, Hideyuki; Takahara, Atsushi.

54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. Vol. 54 1. ed. 2005. p. 1093.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Miyamoto, K, Hosaka, N, Otsuka, H & Takahara, A 2005, Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films. in 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 1 edn, vol. 54, pp. 1093, 54th SPSJ Annual Meeting 2005, Yokohama, Japan, 5/25/05.
Miyamoto K, Hosaka N, Otsuka H, Takahara A. Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films. In 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 1 ed. Vol. 54. 2005. p. 1093
Miyamoto, Kyota ; Hosaka, Nao ; Otsuka, Hideyuki ; Takahara, Atsushi. / Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films. 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. Vol. 54 1. ed. 2005. pp. 1093
@inproceedings{5c47bdc49eb94f77bd83d63a8ed2d7a6,
title = "Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films",
abstract = "Organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with polyhedral oligomeric silsesquioxane (POSS) at one end, were prepared by nitroxide-mediated radical polymerization. Blend films composed of PS-POSS and PS were spin-coated from their toluene solution onto cleaned silicon wafer. Atomic force microscopic observation suggested that PS-POSS was well dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin film served to improve the stability of the thin film against dewetting.",
author = "Kyota Miyamoto and Nao Hosaka and Hideyuki Otsuka and Atsushi Takahara",
year = "2005",
language = "English",
volume = "54",
pages = "1093",
booktitle = "54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan",
edition = "1",

}

TY - GEN

T1 - Dispersion states of silsesquioxane-terminated polystyrene in polystyrene thin films

AU - Miyamoto, Kyota

AU - Hosaka, Nao

AU - Otsuka, Hideyuki

AU - Takahara, Atsushi

PY - 2005

Y1 - 2005

N2 - Organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with polyhedral oligomeric silsesquioxane (POSS) at one end, were prepared by nitroxide-mediated radical polymerization. Blend films composed of PS-POSS and PS were spin-coated from their toluene solution onto cleaned silicon wafer. Atomic force microscopic observation suggested that PS-POSS was well dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin film served to improve the stability of the thin film against dewetting.

AB - Organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with polyhedral oligomeric silsesquioxane (POSS) at one end, were prepared by nitroxide-mediated radical polymerization. Blend films composed of PS-POSS and PS were spin-coated from their toluene solution onto cleaned silicon wafer. Atomic force microscopic observation suggested that PS-POSS was well dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin film served to improve the stability of the thin film against dewetting.

UR - http://www.scopus.com/inward/record.url?scp=33645641306&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33645641306&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:33645641306

VL - 54

SP - 1093

BT - 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan

ER -