Dominant ion species in VHF SiH4/H2 plasma

Yasuhiro Yamauchi, Tomoyoshi Baba, Tsukasa Yamane, Yoshiaki Takeuchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)

Abstract

Dominant ion species in VHF SiH4/H2 plasma (frequency 60 MHz) were estimated from the sheath potential and the electron temperature measured with the Langmuir probe. As the concentration of SiH4/H 2 was increased, the transition of dominant ion species from H + to SiH3+ was observed. When the discharge gap was shorter than 10 mm, measured sheath potentials were anomalously low compared with the calculated ones.

Original languageEnglish
Pages (from-to)549-552
Number of pages4
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Volume7
Issue number3-4
DOIs
Publication statusPublished - 2010
Event23rd International Conference on Amorphous and Nanocrystalline Semiconductors, ICANS23 - Utrecht, Netherlands
Duration: Aug 23 2009Aug 28 2009

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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