Dose-Dependent Etching Selectivity in SiO_2 by Focused Ion Beam

Taizoh Sadoh, Hiroomi Eguchi, Atsushi Kenjo, Masanobu Miyao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1855-1858
Number of pages4
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume42
Issue number4
Publication statusPublished - Apr 30 2003

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