Effect of end group-substrate interaction on aggregation structure of polystyrene ultrathin films

Atsushi Takahara, Tisato Kajiyama

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The aggregation structure of proton-, monocarboxyl-, and dicarboxyl terminated polystyrene (PS) ultrathin films spin-coated onto different substrate surfaces was investigated on the basis of atomic force microscopy (AFM). In the case of the monocarboxyl- and dicarboxyl-terminated PS ultrathin films spin-coated onto Si-wafer, the dewetting occurred after annealing above their bulk glass transition temperatures. In contrast, those (monocarboxyl and dicarboxyl-terminated PS ultrathin films spin-coated) onto aminosilane-treated Si-wafer did not dewet even after annealing above the bulk Tg, owing to the specific interaction between -COOH and -NH2 groups of aminosilane onto the Si-wafer.

Original languageEnglish
Pages (from-to)89-95
Number of pages7
JournalPolymer Journal
Volume31
Issue number1
Publication statusPublished - Dec 1 1999

Fingerprint

Ultrathin films
Polystyrenes
Agglomeration
Substrates
Annealing
Protons
Atomic force microscopy

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Effect of end group-substrate interaction on aggregation structure of polystyrene ultrathin films. / Takahara, Atsushi; Kajiyama, Tisato.

In: Polymer Journal, Vol. 31, No. 1, 01.12.1999, p. 89-95.

Research output: Contribution to journalArticle

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