TY - JOUR
T1 - Effect of excitation frequency on the spatial distributions of a surface wave plasma
AU - Muta, Hiroshi
AU - Nishida, Satoshi
AU - Kuribayashi, Shizuma
AU - Yoshikawa, Naoki
AU - Komatsu, Ryota
AU - Uchino, Kiichiro
AU - Kawai, Yoshinobu
PY - 2011/1
Y1 - 2011/1
N2 - Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies.
AB - Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies.
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U2 - 10.1143/JJAP.50.01AB07
DO - 10.1143/JJAP.50.01AB07
M3 - Article
AN - SCOPUS:79955151877
VL - 50
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
SN - 0021-4922
IS - 1 PART 2
M1 - 01AB07
ER -