Effect of metallic underlayer on structural and magnetic properties of sputtered Fe3O4 films

F. Qin; Y. Nozaki; Kimihide Matsuyama

doi:10.1016/j.jmmm.2003.12.994

Effect of metallic underlayer on structural and magnetic properties of sputtered Fe3O4 films

F. Qin, Y. Nozaki, Kimihide Matsuyama

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Abstract

High-quality Fe₃O₄ films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization M_s are 462 emu/cm³ for Al(50 nm)/Fe₃O₄(200 nm) and 422 emu/cm³ for Cr(45 nm)/Cu(300 nm)/ Fe₃O₄(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm ³.

Original language	English
Journal	Journal of Magnetism and Magnetic Materials
Volume	272-276
Issue number	SUPPL. 1
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.994
Publication status	Published - May 1 2004

All Science Journal Classification (ASJC) codes

Condensed Matter Physics

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title = "Effect of metallic underlayer on structural and magnetic properties of sputtered Fe3O4 films",

abstract = "High-quality Fe3O4 films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization Ms are 462 emu/cm3 for Al(50 nm)/Fe3O4(200 nm) and 422 emu/cm3 for Cr(45 nm)/Cu(300 nm)/ Fe3O4(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm 3.",

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T1 - Effect of metallic underlayer on structural and magnetic properties of sputtered Fe3O4 films

AU - Qin, F.

AU - Nozaki, Y.

AU - Matsuyama, Kimihide

PY - 2004/5/1

Y1 - 2004/5/1

N2 - High-quality Fe3O4 films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization Ms are 462 emu/cm3 for Al(50 nm)/Fe3O4(200 nm) and 422 emu/cm3 for Cr(45 nm)/Cu(300 nm)/ Fe3O4(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm 3.

AB - High-quality Fe3O4 films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization Ms are 462 emu/cm3 for Al(50 nm)/Fe3O4(200 nm) and 422 emu/cm3 for Cr(45 nm)/Cu(300 nm)/ Fe3O4(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm 3.

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JF - Journal of Magnetism and Magnetic Materials

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