TY - JOUR
T1 - Effect of metallic underlayer on structural and magnetic properties of sputtered Fe3O4 films
AU - Qin, F.
AU - Nozaki, Y.
AU - Matsuyama, K.
N1 - Copyright:
Copyright 2021 Elsevier B.V., All rights reserved.
PY - 2004/5
Y1 - 2004/5
N2 - High-quality Fe3O4 films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization Ms are 462 emu/cm3 for Al(50 nm)/Fe3O4(200 nm) and 422 emu/cm3 for Cr(45 nm)/Cu(300 nm)/ Fe3O4(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm 3.
AB - High-quality Fe3O4 films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization Ms are 462 emu/cm3 for Al(50 nm)/Fe3O4(200 nm) and 422 emu/cm3 for Cr(45 nm)/Cu(300 nm)/ Fe3O4(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm 3.
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U2 - 10.1016/j.jmmm.2003.12.994
DO - 10.1016/j.jmmm.2003.12.994
M3 - Article
AN - SCOPUS:23144437694
VL - 272-276
SP - e1835-e1837
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
SN - 0304-8853
IS - SUPPL. 1
ER -