Effect of Mn-Based Slurries on Chemical Mechanical Polishing of SiC Substrates

Panpan Zhao, Tao Yin, Toshiro Doi, Syuhei Kurokawa, Kiyoshi Seshimo, Dongfen Ye, Jianchen Cai

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

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Material Science