Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films

Keiichi Akabori, Keiji Tanaka, Toshihiko Nagamura, Atsushi Takahara, Tisato Kajiyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Mechanical relaxation behavior of polystyrene (PS) and poly (2-vinylprydine) (P2VP) thin and ultrathin films on substrates was examined. Even in the case of the ultrathin films, the α2-relaxation process corresponding to the segmental motion was successfully observed. However, the αa-absorption peak was broadened toward lower and higher temperature sides because of surface and interfacial effects. Interestingly, when a PS ultrathin film was sandwiched between SiOx layers, an additional peak come up with the interfacial segmental motion appeared at the higher temperature side. In the case of the P2VP ultrathin films on the SiOx substrates, the interfacial effect became remarkable due to the strong attractive interaction between chains and the substrate. Finally, it was concluded that chain mobility in the interfacial region was depressed in comparison with that in the internal bulk phase.

Original languageEnglish
Title of host publication54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
Pages925
Number of pages1
Volume54
Edition1
Publication statusPublished - 2005
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: May 25 2005May 27 2005

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period5/25/055/27/05

Fingerprint

Anelastic relaxation
Ultrathin films
Polymer films
Substrates
Polystyrenes
Relaxation processes
Thin films
Temperature

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Akabori, K., Tanaka, K., Nagamura, T., Takahara, A., & Kajiyama, T. (2005). Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. In 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan (1 ed., Vol. 54, pp. 925)

Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. / Akabori, Keiichi; Tanaka, Keiji; Nagamura, Toshihiko; Takahara, Atsushi; Kajiyama, Tisato.

54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. Vol. 54 1. ed. 2005. p. 925.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Akabori, K, Tanaka, K, Nagamura, T, Takahara, A & Kajiyama, T 2005, Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. in 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 1 edn, vol. 54, pp. 925, 54th SPSJ Annual Meeting 2005, Yokohama, Japan, 5/25/05.
Akabori K, Tanaka K, Nagamura T, Takahara A, Kajiyama T. Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. In 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 1 ed. Vol. 54. 2005. p. 925
Akabori, Keiichi ; Tanaka, Keiji ; Nagamura, Toshihiko ; Takahara, Atsushi ; Kajiyama, Tisato. / Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. Vol. 54 1. ed. 2005. pp. 925
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