Abstract
Our original molecular dynamics code was applied to the destruction dynamics of MgO protecting layer in the plasma display panel by Xe sputtering. The effect of surface contamination on the destruction and recrystallization dynamics of the MgO protecting layer was clarified. Especially, we elucidated that adsorbed water molecules are dissociated and hydrogen atoms are intruded into the MgO surface by Xe sputtering. These phenomena were suggested to degrade significantly the second electron emission ability of the MgO protecting layer.
Original language | English |
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Pages | 787-790 |
Number of pages | 4 |
Publication status | Published - Dec 1 2007 |
Event | 14th International Display Workshops, IDW '07 - Sapporo, Japan Duration: Dec 5 2007 → Dec 5 2007 |
Other
Other | 14th International Display Workshops, IDW '07 |
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Country/Territory | Japan |
City | Sapporo |
Period | 12/5/07 → 12/5/07 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Radiology Nuclear Medicine and imaging
- Atomic and Molecular Physics, and Optics