TY - JOUR
T1 - Effect of the s p2 carbon phase on n -type conduction in nanodiamond films
AU - Ikeda, Tomohiro
AU - Teii, Kungen
AU - Casiraghi, C.
AU - Robertson, J.
AU - Ferrari, A. C.
N1 - Funding Information:
The authors thank Professor H. Nakashima for Hall-effect measurement. This research was supported by a Grant-in-Aid from the Ministry of Education, Science, Sports, and Culture of Japan. T.I. was supported by JSPS Research Fellowships for Young Scientists. K.T. acknowledges funding from the Iketani Science and Technology Foundation, the Kurata Memorial Hitachi Science and Technology Foundation, and the Japan-Taiwan Joint Research Program of Interchange Association, Japan. C.C. acknowledges funding from the Oppenheimer Fund. A.C.F. acknowledges funding from the Royal Society and the Leverhulme Trust.
PY - 2008
Y1 - 2008
N2 - Structural and electrical conduction properties of nitrogen-doped nanocrystalline diamond films are studied as a function of deposition temperature (TD) in a microwave Ar-rich/ CH4 plasma with 30% N2 addition. Hall- and Seebeck-effect measurements confirm n -type conduction for TD above 1100 K. For TD from 1100 and 1220 K, the electron concentration increases up to 1020 cm-3 and the electron mobility is in the range of 4-8 cm2 V-1 s-1. For TD above 1250 K, the mobility decreases to ∼1 cm2 V-1 s-1. Low conductivity films deposited at low TD exhibit semiconductorlike thermal activation in the Arrhenius plots, while high conductivity films deposited at high TD are almost temperature independent, indicative of quasimetallic conduction. The nitrogen concentration in the films is about 0.3 at. %, independent of TD. As TD is increased, the s p2 content and order increase. This is responsible for the appearance of midgap states, their delocalization, and the larger distance between diamond grains. The high conductivity at high TD is due to the amount and crystallinity of s p2 carbon, rather than the nitrogen concentration.
AB - Structural and electrical conduction properties of nitrogen-doped nanocrystalline diamond films are studied as a function of deposition temperature (TD) in a microwave Ar-rich/ CH4 plasma with 30% N2 addition. Hall- and Seebeck-effect measurements confirm n -type conduction for TD above 1100 K. For TD from 1100 and 1220 K, the electron concentration increases up to 1020 cm-3 and the electron mobility is in the range of 4-8 cm2 V-1 s-1. For TD above 1250 K, the mobility decreases to ∼1 cm2 V-1 s-1. Low conductivity films deposited at low TD exhibit semiconductorlike thermal activation in the Arrhenius plots, while high conductivity films deposited at high TD are almost temperature independent, indicative of quasimetallic conduction. The nitrogen concentration in the films is about 0.3 at. %, independent of TD. As TD is increased, the s p2 content and order increase. This is responsible for the appearance of midgap states, their delocalization, and the larger distance between diamond grains. The high conductivity at high TD is due to the amount and crystallinity of s p2 carbon, rather than the nitrogen concentration.
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U2 - 10.1063/1.2990061
DO - 10.1063/1.2990061
M3 - Article
AN - SCOPUS:54049118016
SN - 0021-8979
VL - 104
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 7
M1 - 073720
ER -