Effect of TiO2 thin film thickness on NO and SO2 removals by dielectric barrier discharge-photocatalyst hybrid process

Hung Cuong Pham; Kyo Seon Kim

doi:10.1021/ie302713p

Effect of TiO₂ thin film thickness on NO and SO₂ removals by dielectric barrier discharge-photocatalyst hybrid process

Hung Cuong Pham, Kyo Seon Kim

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

We coated the glass beads with TiO₂ thin films by a rotating cylindrical plasma chemical vapor deposition (PCVD) reactor and applied the TiO₂-coated glass beads to remove NO and SO₂ in a dielectric barrier discharge-photocatalyst hybrid (DBD-PH) process. The thickness of TiO₂ thin films on glass beads was controlled precisely by changing the deposition time. The UV light generated from the plasma discharge in DBD-PH process activates the TiO₂ photocatalyst on glass beads and the NO and SO₂ removal efficiency are removed more easily by the reactive radicals generated from plasma reactions and TiO₂ photocatalyst. We found the optimum thickness of TiO₂ thin film on glass beads was about 600 nm to remove NO and SO₂ by the DBD-PH process. The NO and SO₂ removal efficiencies increase as applied peak voltage, residence time or pulsed frequency increases or as initial NO and SO₂ concentration decreases.

Original language	English
Pages (from-to)	5296-5301
Number of pages	6
Journal	Industrial and Engineering Chemistry Research
Volume	52
Issue number	15
DOIs	https://doi.org/10.1021/ie302713p
Publication status	Published - Apr 17 2013
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemistry(all)
Chemical Engineering(all)
Industrial and Manufacturing Engineering

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10.1021/ie302713p

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title = "Effect of TiO2 thin film thickness on NO and SO2 removals by dielectric barrier discharge-photocatalyst hybrid process",

abstract = "We coated the glass beads with TiO2 thin films by a rotating cylindrical plasma chemical vapor deposition (PCVD) reactor and applied the TiO2-coated glass beads to remove NO and SO2 in a dielectric barrier discharge-photocatalyst hybrid (DBD-PH) process. The thickness of TiO2 thin films on glass beads was controlled precisely by changing the deposition time. The UV light generated from the plasma discharge in DBD-PH process activates the TiO2 photocatalyst on glass beads and the NO and SO2 removal efficiency are removed more easily by the reactive radicals generated from plasma reactions and TiO2 photocatalyst. We found the optimum thickness of TiO2 thin film on glass beads was about 600 nm to remove NO and SO2 by the DBD-PH process. The NO and SO2 removal efficiencies increase as applied peak voltage, residence time or pulsed frequency increases or as initial NO and SO2 concentration decreases.",

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AU - Kim, Kyo Seon

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N2 - We coated the glass beads with TiO2 thin films by a rotating cylindrical plasma chemical vapor deposition (PCVD) reactor and applied the TiO2-coated glass beads to remove NO and SO2 in a dielectric barrier discharge-photocatalyst hybrid (DBD-PH) process. The thickness of TiO2 thin films on glass beads was controlled precisely by changing the deposition time. The UV light generated from the plasma discharge in DBD-PH process activates the TiO2 photocatalyst on glass beads and the NO and SO2 removal efficiency are removed more easily by the reactive radicals generated from plasma reactions and TiO2 photocatalyst. We found the optimum thickness of TiO2 thin film on glass beads was about 600 nm to remove NO and SO2 by the DBD-PH process. The NO and SO2 removal efficiencies increase as applied peak voltage, residence time or pulsed frequency increases or as initial NO and SO2 concentration decreases.

AB - We coated the glass beads with TiO2 thin films by a rotating cylindrical plasma chemical vapor deposition (PCVD) reactor and applied the TiO2-coated glass beads to remove NO and SO2 in a dielectric barrier discharge-photocatalyst hybrid (DBD-PH) process. The thickness of TiO2 thin films on glass beads was controlled precisely by changing the deposition time. The UV light generated from the plasma discharge in DBD-PH process activates the TiO2 photocatalyst on glass beads and the NO and SO2 removal efficiency are removed more easily by the reactive radicals generated from plasma reactions and TiO2 photocatalyst. We found the optimum thickness of TiO2 thin film on glass beads was about 600 nm to remove NO and SO2 by the DBD-PH process. The NO and SO2 removal efficiencies increase as applied peak voltage, residence time or pulsed frequency increases or as initial NO and SO2 concentration decreases.

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Effect of TiO₂ thin film thickness on NO and SO₂ removals by dielectric barrier discharge-photocatalyst hybrid process

Abstract

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