In this paper, we attempt material manipulation of p-type silicon wafers by using dynamic stress with high frequency (called "ultrasonic strain"). A piezoelectric device is used as the source of a time-dependent external field. We have succeeded in manipulating the electrical resistance of a semiconductor p-type silicon wafer with ultrasonic strain with a frequency of 1 MHz. The magnitude of the variation in the electrical resistance was over 2.0 ' 103O and approximately 1.0 ' 103O, corresponding to quadruple and septuple the initial values in the p-type silicon wafers  and , respectively. The response speed against ultrasonic strain was very fast and was less than 0.2 s, which could yield the basis of a new switching-device mechanism.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)