Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

Original languageEnglish
Title of host publicationTENCON 2010 - 2010 IEEE Region 10 Conference
Pages1943-1947
Number of pages5
DOIs
Publication statusPublished - 2010
Event2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan
Duration: Nov 21 2010Nov 24 2010

Other

Other2010 IEEE Region 10 Conference, TENCON 2010
CountryJapan
CityFukuoka
Period11/21/1011/24/10

Fingerprint

Amplitude modulation
Plasmas
Electric potential
Plasma CVD

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Computer Science Applications

Cite this

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. / Kamataki, Kunihiro; Miyata, Hiroshi; Koga, Kazunori; Uchida, Giichiro; Itagaki, Naho; Yamashita, Daisuke; Matsuzaki, Hidefumi; Shiratani, Masaharu.

TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 1943-1947 5686456.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kamataki, K, Miyata, H, Koga, K, Uchida, G, Itagaki, N, Yamashita, D, Matsuzaki, H & Shiratani, M 2010, Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. in TENCON 2010 - 2010 IEEE Region 10 Conference., 5686456, pp. 1943-1947, 2010 IEEE Region 10 Conference, TENCON 2010, Fukuoka, Japan, 11/21/10. https://doi.org/10.1109/TENCON.2010.5686456
Kamataki K, Miyata H, Koga K, Uchida G, Itagaki N, Yamashita D et al. Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. In TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 1943-1947. 5686456 https://doi.org/10.1109/TENCON.2010.5686456
Kamataki, Kunihiro ; Miyata, Hiroshi ; Koga, Kazunori ; Uchida, Giichiro ; Itagaki, Naho ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Shiratani, Masaharu. / Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. pp. 1943-1947
@inproceedings{6180acec777a49548470b3e3a1bb6179,
title = "Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas",
abstract = "We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 {\%}. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.",
author = "Kunihiro Kamataki and Hiroshi Miyata and Kazunori Koga and Giichiro Uchida and Naho Itagaki and Daisuke Yamashita and Hidefumi Matsuzaki and Masaharu Shiratani",
year = "2010",
doi = "10.1109/TENCON.2010.5686456",
language = "English",
isbn = "9781424468904",
pages = "1943--1947",
booktitle = "TENCON 2010 - 2010 IEEE Region 10 Conference",

}

TY - GEN

T1 - Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

AU - Kamataki, Kunihiro

AU - Miyata, Hiroshi

AU - Koga, Kazunori

AU - Uchida, Giichiro

AU - Itagaki, Naho

AU - Yamashita, Daisuke

AU - Matsuzaki, Hidefumi

AU - Shiratani, Masaharu

PY - 2010

Y1 - 2010

N2 - We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

AB - We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

UR - http://www.scopus.com/inward/record.url?scp=79951665071&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79951665071&partnerID=8YFLogxK

U2 - 10.1109/TENCON.2010.5686456

DO - 10.1109/TENCON.2010.5686456

M3 - Conference contribution

AN - SCOPUS:79951665071

SN - 9781424468904

SP - 1943

EP - 1947

BT - TENCON 2010 - 2010 IEEE Region 10 Conference

ER -