Effects of atmosphere and ultraviolet light irradiation on chemical mechanical polishing characteristics of SiC wafers

Osamu Ohnishi, Toshiro Doi, Syuhei Kurokawa, Tsutomu Yamazaki, Michio Uneda, Tao Yin, Isamu Koshiyama, Koichiro Ichikawa, Hideo Aida

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11 Citations (Scopus)

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