Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma chemical vapor deposition

Yeonwon Kim, Takeaki Matsunaga, Kenta Nakahara, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

We investigated effects of incorporation of Si crystalline nanoparticles into microcrystalline Si films during their deposition on their growth, structure and properties using multi-hollow discharge plasma chemical vapor deposition. The films with nanoparticles show a lower (220) orientation ratio than those without nanoparticles, whereas both the films have nearly the same film thickness and crystallinity. The films with nanoparticles have inverted conical growth, while the films without nanoparticles have columnar growth. Nucleation density of the films with nanoparticles is higher than that of the films without nanoparticles. Both photo and dark conductivities of the films with nanoparticles tend to be lower than those without nanoparticles. Thus, incorporation of small amount of nanoparticles into microcrystalline Si film affects growth, structure and properties of the films.

Original languageEnglish
Pages (from-to)29-33
Number of pages5
JournalThin Solid Films
Volume523
DOIs
Publication statusPublished - Nov 15 2012

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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