Abstract
The effects of gas flow on particle growth in silane RF discharges in a plasma chemical vapor deposition (PCVD) reactor with a shower-type powered electrode are studied using an in situ two-dimensional polarization-sensitive laser-light-scattering method. Particle growth depends on both the production of short-lifetime radicals and the loss of neutral clusters in the radical production region around the plasma/sheath boundary near the powered electrode. Gas flow of a velocity above about 6 cm/s is effective in suppressing particle growth because of increase in loss of neutral clusters. Moreover, particles larger than 120 nm in size that flow to the plasma/sheath boundary near the grounded electrode are found to pass through the sheath. This implies that such particles may deposit on film surfaces for PCVD reactors with the shower-type powered electrode.
| Original language | English |
|---|---|
| Pages (from-to) | 4556-4560 |
| Number of pages | 5 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 38 |
| Issue number | 7 B |
| DOIs | |
| Publication status | Published - Jul 1999 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)