Effects of hydrogenation on thermal conductivity of ultrananocrystalline diamond/amorphous carbon composite films prepared via coaxial arc plasma deposition

Satoshi Takeichi, Takashi Nishiyama, Mitsuru Tabara, Shuichi Kawawaki, Masamichi Kohno, Koji Takahashi, Tsuyoshi Yoshitake

Research output: Contribution to journalArticle

Abstract

Ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite (UNCD/a-C:H) and UNCD/non-hydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were prepared via coaxial arc plasma deposition, and their thermal conductivity and interfacial conductance in grain boundaries were measured using a time-domain thermoreflectance method. The interfacial conductance was estimated to be 1,010 and 4,892MW/(m 2 &K) for UNCD/a-C:H and UNCD/a-C films, respectively. The reasons for the hydrogenated film having lower interfacial conductance than the non-hydrogenated film are 1) the reduced number of carriers that contribute to heat transport and 2) the hydrogen atoms, which are preferentially located at the grain boundaries and enhance phonon scattering.

Original languageEnglish
Article number065101
JournalApplied Physics Express
Volume11
Issue number6
DOIs
Publication statusPublished - Jun 1 2018

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Plasma deposition
Carbon films
Amorphous carbon
Composite films
plasma jets
Hydrogenation
hydrogenation
Diamonds
Thermal conductivity
thermal conductivity
diamonds
composite materials
carbon
Amorphous films
Grain boundaries
grain boundaries
Phonon scattering
Composite materials
hydrogen atoms
heat

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Effects of hydrogenation on thermal conductivity of ultrananocrystalline diamond/amorphous carbon composite films prepared via coaxial arc plasma deposition. / Takeichi, Satoshi; Nishiyama, Takashi; Tabara, Mitsuru; Kawawaki, Shuichi; Kohno, Masamichi; Takahashi, Koji; Yoshitake, Tsuyoshi.

In: Applied Physics Express, Vol. 11, No. 6, 065101, 01.06.2018.

Research output: Contribution to journalArticle

@article{52333de22d5b42779cef874e372c6f89,
title = "Effects of hydrogenation on thermal conductivity of ultrananocrystalline diamond/amorphous carbon composite films prepared via coaxial arc plasma deposition",
abstract = "Ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite (UNCD/a-C:H) and UNCD/non-hydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were prepared via coaxial arc plasma deposition, and their thermal conductivity and interfacial conductance in grain boundaries were measured using a time-domain thermoreflectance method. The interfacial conductance was estimated to be 1,010 and 4,892MW/(m 2 &K) for UNCD/a-C:H and UNCD/a-C films, respectively. The reasons for the hydrogenated film having lower interfacial conductance than the non-hydrogenated film are 1) the reduced number of carriers that contribute to heat transport and 2) the hydrogen atoms, which are preferentially located at the grain boundaries and enhance phonon scattering.",
author = "Satoshi Takeichi and Takashi Nishiyama and Mitsuru Tabara and Shuichi Kawawaki and Masamichi Kohno and Koji Takahashi and Tsuyoshi Yoshitake",
year = "2018",
month = "6",
day = "1",
doi = "10.7567/APEX.11.065101",
language = "English",
volume = "11",
journal = "Applied Physics Express",
issn = "1882-0778",
publisher = "Japan Society of Applied Physics",
number = "6",

}

TY - JOUR

T1 - Effects of hydrogenation on thermal conductivity of ultrananocrystalline diamond/amorphous carbon composite films prepared via coaxial arc plasma deposition

AU - Takeichi, Satoshi

AU - Nishiyama, Takashi

AU - Tabara, Mitsuru

AU - Kawawaki, Shuichi

AU - Kohno, Masamichi

AU - Takahashi, Koji

AU - Yoshitake, Tsuyoshi

PY - 2018/6/1

Y1 - 2018/6/1

N2 - Ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite (UNCD/a-C:H) and UNCD/non-hydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were prepared via coaxial arc plasma deposition, and their thermal conductivity and interfacial conductance in grain boundaries were measured using a time-domain thermoreflectance method. The interfacial conductance was estimated to be 1,010 and 4,892MW/(m 2 &K) for UNCD/a-C:H and UNCD/a-C films, respectively. The reasons for the hydrogenated film having lower interfacial conductance than the non-hydrogenated film are 1) the reduced number of carriers that contribute to heat transport and 2) the hydrogen atoms, which are preferentially located at the grain boundaries and enhance phonon scattering.

AB - Ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite (UNCD/a-C:H) and UNCD/non-hydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were prepared via coaxial arc plasma deposition, and their thermal conductivity and interfacial conductance in grain boundaries were measured using a time-domain thermoreflectance method. The interfacial conductance was estimated to be 1,010 and 4,892MW/(m 2 &K) for UNCD/a-C:H and UNCD/a-C films, respectively. The reasons for the hydrogenated film having lower interfacial conductance than the non-hydrogenated film are 1) the reduced number of carriers that contribute to heat transport and 2) the hydrogen atoms, which are preferentially located at the grain boundaries and enhance phonon scattering.

UR - http://www.scopus.com/inward/record.url?scp=85047945725&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85047945725&partnerID=8YFLogxK

U2 - 10.7567/APEX.11.065101

DO - 10.7567/APEX.11.065101

M3 - Article

VL - 11

JO - Applied Physics Express

JF - Applied Physics Express

SN - 1882-0778

IS - 6

M1 - 065101

ER -