Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

Yeonwon Kim; Takeaki Matsunaga; Kenta Nakahara; Hyunwoong Seo; Kunihiro Kamataki; Giichiro Uchida; Naho Itagaki; Kazunori Koga; Masaharu Shiratani

doi:10.1016/j.surfcoat.2012.04.029

Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

Yeonwon Kim, Takeaki Matsunaga, Kenta Nakahara, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

We investigated the effects of incorporation of crystalline nanoparticles on properties of microcrystalline Si films deposited using multi-hollow discharge plasma CVD. Both photo and dark conductivity of films with nanoparticles are lower than the films without nanoparticles. Films with nanoparticles have higher photosensitivity than those of films without nanoparticles in a low crystallinity region. Microcrystalline films of high crystallinity and high photosensitivity are obtained only in a range of small volume fraction of nanoparticles under low dilution ratio, R=([SiH₄]+[H₂])/[SiH₄]. Incorporation of small amount of nanoparticles into films strongly affects photo and dark conductivity of films.

Original language	English
Pages (from-to)	S550-S553
Journal	Surface and Coatings Technology
Volume	228
Issue number	SUPPL.1
DOIs	https://doi.org/10.1016/j.surfcoat.2012.04.029
Publication status	Published - Aug 15 2013

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2012.04.029

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title = "Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD",

abstract = "We investigated the effects of incorporation of crystalline nanoparticles on properties of microcrystalline Si films deposited using multi-hollow discharge plasma CVD. Both photo and dark conductivity of films with nanoparticles are lower than the films without nanoparticles. Films with nanoparticles have higher photosensitivity than those of films without nanoparticles in a low crystallinity region. Microcrystalline films of high crystallinity and high photosensitivity are obtained only in a range of small volume fraction of nanoparticles under low dilution ratio, R=([SiH4]+[H2])/[SiH4]. Incorporation of small amount of nanoparticles into films strongly affects photo and dark conductivity of films.",

author = "Yeonwon Kim and Takeaki Matsunaga and Kenta Nakahara and Hyunwoong Seo and Kunihiro Kamataki and Giichiro Uchida and Naho Itagaki and Kazunori Koga and Masaharu Shiratani",

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T1 - Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

AU - Kim, Yeonwon

AU - Matsunaga, Takeaki

AU - Nakahara, Kenta

AU - Seo, Hyunwoong

AU - Kamataki, Kunihiro

AU - Uchida, Giichiro

AU - Itagaki, Naho

AU - Koga, Kazunori

AU - Shiratani, Masaharu

PY - 2013/8/15

Y1 - 2013/8/15

N2 - We investigated the effects of incorporation of crystalline nanoparticles on properties of microcrystalline Si films deposited using multi-hollow discharge plasma CVD. Both photo and dark conductivity of films with nanoparticles are lower than the films without nanoparticles. Films with nanoparticles have higher photosensitivity than those of films without nanoparticles in a low crystallinity region. Microcrystalline films of high crystallinity and high photosensitivity are obtained only in a range of small volume fraction of nanoparticles under low dilution ratio, R=([SiH4]+[H2])/[SiH4]. Incorporation of small amount of nanoparticles into films strongly affects photo and dark conductivity of films.

AB - We investigated the effects of incorporation of crystalline nanoparticles on properties of microcrystalline Si films deposited using multi-hollow discharge plasma CVD. Both photo and dark conductivity of films with nanoparticles are lower than the films without nanoparticles. Films with nanoparticles have higher photosensitivity than those of films without nanoparticles in a low crystallinity region. Microcrystalline films of high crystallinity and high photosensitivity are obtained only in a range of small volume fraction of nanoparticles under low dilution ratio, R=([SiH4]+[H2])/[SiH4]. Incorporation of small amount of nanoparticles into films strongly affects photo and dark conductivity of films.

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JF - Surface and Coatings Technology

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ER -

Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

Abstract

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