Effects of nitrogen on crystal growth of sputter-deposited ZnO films for transparent conducting oxide

Iping Suhariadi, Kouichiro Oshikawa, Kazunari Kuwahara, Kouichi Matsushima, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We have studied the effects of the N2 gas flow rate on the surface morphology of ZnO films deposited by the sputtering of a ZnO target using Ar/ N2. Height-height correlation function (HHCF) analysis indicates that introducing a small amount of N2 (<5 sccm) to the sputtering atmosphere enhances adatom migration, leading to a larger grain size in the ZnO films associated with an increase in the lateral correlation length. The HHCF analysis also reveals that films deposited with and without N 2 exhibit a self-affine fractal surface structure. We demonstrate that utilizing such ZnO films deposited using Ar/N2 as buffer layers, the crystallinity of ZnO:Al (AZO) films on the buffer layers can be greatly improved. The electrical resistivity of 100-nm-thick AZO films decreases from 1.8 × 10-3 to 4:0 × 10-4 Ω·cm by utilizing a ZnO buffer layers prepared at N2 flow rate of 5 sccm.

Original languageEnglish
Article number11NB03
JournalJapanese Journal of Applied Physics
Volume52
Issue number11 PART 2
DOIs
Publication statusPublished - Nov 1 2013

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Crystal growth
crystal growth
Nitrogen
nitrogen
conduction
Buffer layers
Oxides
oxides
buffers
Sputtering
flow velocity
sputtering
Flow rate
Adatoms
Thick films
Surface structure
Fractals
adatoms
thick films
Surface morphology

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Effects of nitrogen on crystal growth of sputter-deposited ZnO films for transparent conducting oxide. / Suhariadi, Iping; Oshikawa, Kouichiro; Kuwahara, Kazunari; Matsushima, Kouichi; Yamashita, Daisuke; Uchida, Giichiro; Koga, Kazunori; Shiratani, Masaharu; Itagaki, Naho.

In: Japanese Journal of Applied Physics, Vol. 52, No. 11 PART 2, 11NB03, 01.11.2013.

Research output: Contribution to journalArticle

Suhariadi I, Oshikawa K, Kuwahara K, Matsushima K, Yamashita D, Uchida G et al. Effects of nitrogen on crystal growth of sputter-deposited ZnO films for transparent conducting oxide. Japanese Journal of Applied Physics. 2013 Nov 1;52(11 PART 2). 11NB03. https://doi.org/10.7567/JJAP.52.11NB03
Suhariadi, Iping ; Oshikawa, Kouichiro ; Kuwahara, Kazunari ; Matsushima, Kouichi ; Yamashita, Daisuke ; Uchida, Giichiro ; Koga, Kazunori ; Shiratani, Masaharu ; Itagaki, Naho. / Effects of nitrogen on crystal growth of sputter-deposited ZnO films for transparent conducting oxide. In: Japanese Journal of Applied Physics. 2013 ; Vol. 52, No. 11 PART 2.
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