Ti-Si-N hard coatings have been fabricated at different N2/Ar gas ratio (N2:Ar = 1:1, 1:2, or 1:3) sputtering conditions by the hybrid Physical Vapor Deposition (PVD) method, which consists of sputtering and arc ion plating (AIP). The pure silicon and titanium targets were selected for reactive sputtering and the AIP process, respectively. Field Emission Scanning Electron Microscopy (FESEM) and Energy Dispersive X-ray Spectroscopy (EDS) analysis has shown that the Ti/Si ratio increased as the Ar gas flow rate increased. Moreover, it found that the main growth plane of Ti-Si-N film was changed from (111) plane to (220) plane with increasing Ar gas flow from the results of X-ray diffraction (XRD) analysis. The wear rate of composite films was found to be lower than that of monolithic TiN with different friction coefficients at the initial running-in stage.
All Science Journal Classification (ASJC) codes
- Ceramics and Composites
- Condensed Matter Physics
- Materials Chemistry