Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc

Naho Itagaki; Kazuto Takeuchi; Nanoka Miyahara; Kouki Imoto; Hyunwoong Seo; Kazunori Koga; Masaharu Shiratani

doi:10.4028/www.scientific.net/MSF.941.2093

Effects of sputtering pressure on (Zno)_x(inn)_1-x crystal film growth at 450ºc

Naho Itagaki, Kazuto Takeuchi, Nanoka Miyahara, Kouki Imoto, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

Electronic Devices

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We studied effects of sputtering pressure on growth of (ZnO)_x(InN)_1-x crystal films deposited at 450ºC by rf magnetron sputtering. Epitaxial growth of (ZnO)_x(InN)_1-x films was realized on single-crystalline ZnO template. X-ray diffraction measurements show that full width at half maximum of the rocking curves from the (101) plane of the films reaches minimum value of 0.11˚ at 0.5 Pa. The sputtering gas pressure is a key tuning knob for controlling the crystal quality of ZION films.

Original language	English
Title of host publication	THERMEC 2018
Editors	R. Shabadi, Mihail Ionescu, M. Jeandin, C. Richard, Tara Chandra
Publisher	Trans Tech Publications Ltd
Pages	2093-2098
Number of pages	6
ISBN (Print)	9783035712087
DOIs	https://doi.org/10.4028/www.scientific.net/MSF.941.2093
Publication status	Published - Jan 1 2018
Event	10th International Conference on Processing and Manufacturing of Advanced Materials, 2018 - Paris, France Duration: Jul 9 2018 → Jul 13 2018

Publication series

Name	Materials Science Forum
Volume	941 MSF
ISSN (Print)	0255-5476
ISSN (Electronic)	1662-9752

Conference

Conference	10th International Conference on Processing and Manufacturing of Advanced Materials, 2018
Country	France
City	Paris
Period	7/9/18 → 7/13/18

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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Itagaki, N., Takeuchi, K., Miyahara, N., Imoto, K., Seo, H., Koga, K., & Shiratani, M. (2018). Effects of sputtering pressure on (Zno)_x(inn)_1-x crystal film growth at 450ºc. In R. Shabadi, M. Ionescu, M. Jeandin, C. Richard, & T. Chandra (Eds.), THERMEC 2018 (pp. 2093-2098). (Materials Science Forum; Vol. 941 MSF). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/MSF.941.2093

Effects of sputtering pressure on (Zno)_x(inn)_1-x crystal film growth at 450ºc. / Itagaki, Naho; Takeuchi, Kazuto; Miyahara, Nanoka; Imoto, Kouki; Seo, Hyunwoong; Koga, Kazunori ; Shiratani, Masaharu.

THERMEC 2018. ed. / R. Shabadi; Mihail Ionescu; M. Jeandin; C. Richard; Tara Chandra. Trans Tech Publications Ltd, 2018. p. 2093-2098 (Materials Science Forum; Vol. 941 MSF).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Itagaki, N, Takeuchi, K, Miyahara, N, Imoto, K, Seo, H, Koga, K & Shiratani, M 2018, Effects of sputtering pressure on (Zno)_x(inn)_1-x crystal film growth at 450ºc. in R Shabadi, M Ionescu, M Jeandin, C Richard & T Chandra (eds), THERMEC 2018. Materials Science Forum, vol. 941 MSF, Trans Tech Publications Ltd, pp. 2093-2098, 10th International Conference on Processing and Manufacturing of Advanced Materials, 2018, Paris, France, 7/9/18. https://doi.org/10.4028/www.scientific.net/MSF.941.2093

Itagaki, Naho ; Takeuchi, Kazuto ; Miyahara, Nanoka ; Imoto, Kouki ; Seo, Hyunwoong ; Koga, Kazunori ; Shiratani, Masaharu. / Effects of sputtering pressure on (Zno)_x(inn)_1-x crystal film growth at 450ºc. THERMEC 2018. editor / R. Shabadi ; Mihail Ionescu ; M. Jeandin ; C. Richard ; Tara Chandra. Trans Tech Publications Ltd, 2018. pp. 2093-2098 (Materials Science Forum).

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abstract = "We studied effects of sputtering pressure on growth of (ZnO)x(InN)1-x crystal films deposited at 450ºC by rf magnetron sputtering. Epitaxial growth of (ZnO)x(InN)1-x films was realized on single-crystalline ZnO template. X-ray diffraction measurements show that full width at half maximum of the rocking curves from the (101) plane of the films reaches minimum value of 0.11˚ at 0.5 Pa. The sputtering gas pressure is a key tuning knob for controlling the crystal quality of ZION films.",

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