@inproceedings{944a347b2b654582a47d441707798065,
title = "Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc",
abstract = "We studied effects of sputtering pressure on growth of (ZnO)x(InN)1-x crystal films deposited at 450ºC by rf magnetron sputtering. Epitaxial growth of (ZnO)x(InN)1-x films was realized on single-crystalline ZnO template. X-ray diffraction measurements show that full width at half maximum of the rocking curves from the (101) plane of the films reaches minimum value of 0.11˚ at 0.5 Pa. The sputtering gas pressure is a key tuning knob for controlling the crystal quality of ZION films.",
author = "Naho Itagaki and Kazuto Takeuchi and Nanoka Miyahara and Kouki Imoto and Hyunwoong Seo and Kazunori Koga and Masaharu Shiratani",
note = "Funding Information: This work was partially supported by JSPS KAKENHI Grant Number JP15H05431, Iketani Science and Technology Foundation, and NTT collaborative research. Publisher Copyright: {\textcopyright} 2018 Trans Tech Publications, Switzerland.; 10th International Conference on Processing and Manufacturing of Advanced Materials, 2018 ; Conference date: 09-07-2018 Through 13-07-2018",
year = "2018",
doi = "10.4028/www.scientific.net/MSF.941.2093",
language = "English",
isbn = "9783035712087",
series = "Materials Science Forum",
publisher = "Trans Tech Publications Ltd",
pages = "2093--2098",
editor = "R. Shabadi and Mihail Ionescu and M. Jeandin and C. Richard and Tara Chandra",
booktitle = "THERMEC 2018",
}