Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment

Haibin Li; Toyoki Kunitake

doi:10.1016/j.micromeso.2006.08.001

Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment

Haibin Li, Toyoki Kunitake

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

A highly proton-conducting silica film (thickness, 150 nm) was successfully fabricated by combination of template synthesis with a nonionic surfactant and subsequent oxygen plasma treatment. This ultrathin silica film is mechanically and thermally stable and possesses abundant silanol groups in the nanopore. It exhibited proton conductivities greater by 1-2 orders of magnitude than those of the corresponding heat-treated silica film in humid air.

Original language	English
Pages (from-to)	42-48
Number of pages	7
Journal	Microporous and Mesoporous Materials
Volume	97
Issue number	1-3
DOIs	https://doi.org/10.1016/j.micromeso.2006.08.001
Publication status	Published - Dec 29 2006
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanics of Materials

Access to Document

10.1016/j.micromeso.2006.08.001

Fingerprint Dive into the research topics of 'Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment'. Together they form a unique fingerprint.

Cite this

@article{6946b11dde394beb91915aca7c6e82c7,

title = "Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment",

abstract = "A highly proton-conducting silica film (thickness, 150 nm) was successfully fabricated by combination of template synthesis with a nonionic surfactant and subsequent oxygen plasma treatment. This ultrathin silica film is mechanically and thermally stable and possesses abundant silanol groups in the nanopore. It exhibited proton conductivities greater by 1-2 orders of magnitude than those of the corresponding heat-treated silica film in humid air.",

author = "Haibin Li and Toyoki Kunitake",

year = "2006",

month = dec,

day = "29",

doi = "10.1016/j.micromeso.2006.08.001",

language = "English",

volume = "97",

pages = "42--48",

journal = "Microporous and Mesoporous Materials",

issn = "1387-1811",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment

AU - Li, Haibin

AU - Kunitake, Toyoki

PY - 2006/12/29

Y1 - 2006/12/29

N2 - A highly proton-conducting silica film (thickness, 150 nm) was successfully fabricated by combination of template synthesis with a nonionic surfactant and subsequent oxygen plasma treatment. This ultrathin silica film is mechanically and thermally stable and possesses abundant silanol groups in the nanopore. It exhibited proton conductivities greater by 1-2 orders of magnitude than those of the corresponding heat-treated silica film in humid air.

AB - A highly proton-conducting silica film (thickness, 150 nm) was successfully fabricated by combination of template synthesis with a nonionic surfactant and subsequent oxygen plasma treatment. This ultrathin silica film is mechanically and thermally stable and possesses abundant silanol groups in the nanopore. It exhibited proton conductivities greater by 1-2 orders of magnitude than those of the corresponding heat-treated silica film in humid air.

UR - http://www.scopus.com/inward/record.url?scp=33751320385&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33751320385&partnerID=8YFLogxK

U2 - 10.1016/j.micromeso.2006.08.001

DO - 10.1016/j.micromeso.2006.08.001

M3 - Article

AN - SCOPUS:33751320385

VL - 97

SP - 42

EP - 48

JO - Microporous and Mesoporous Materials

JF - Microporous and Mesoporous Materials

SN - 1387-1811

IS - 1-3

ER -