Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment

Haibin Li; Toyoki Kunitake

doi:10.1016/j.micromeso.2006.08.001

Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment

Haibin Li, Toyoki Kunitake

Research output: Contribution to journal › Article

15 Citations (Scopus)

Abstract

A highly proton-conducting silica film (thickness, 150 nm) was successfully fabricated by combination of template synthesis with a nonionic surfactant and subsequent oxygen plasma treatment. This ultrathin silica film is mechanically and thermally stable and possesses abundant silanol groups in the nanopore. It exhibited proton conductivities greater by 1-2 orders of magnitude than those of the corresponding heat-treated silica film in humid air.

Original language	English
Pages (from-to)	42-48
Number of pages	7
Journal	Microporous and Mesoporous Materials
Volume	97
Issue number	1-3
DOIs	https://doi.org/10.1016/j.micromeso.2006.08.001
Publication status	Published - Dec 29 2006
Externally published	Yes

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All Science Journal Classification (ASJC) codes

Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanics of Materials

Cite this

Li, H., & Kunitake, T. (2006). Efficient proton conduction of nanometer-thick film of porous silica as prepared by oxygen plasma treatment. Microporous and Mesoporous Materials, 97(1-3), 42-48. https://doi.org/10.1016/j.micromeso.2006.08.001

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Access to Document

10.1016/j.micromeso.2006.08.001