Efficient proton conductivity of gas-tight nanomembranes of silica-based double oxides

Yoshitaka Aoki, Emi Muto, Aiko Nakao, Toyoki Kunitake

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

An experiment was conducted to report that protonic conduction is a common feature of amorphous films of many silica-based double oxides and that their sub-100-nm thick membranes can act as effective barriers against diffusion of H2 molecules. An aluminosilicate film of 100-nm thickness was prepared from a 100 mm mixed sol of AlCl3 and tetraethoxysilane (TEOS) with atomic ratio of Al/Si = 0.1/0.9 in ethanol. All of the metal alkoxides were used without further purification. Thin films of various metal silicates were prepared from mixed solutions of TEOS and individual metal alkoxides. Appropriate doses of TEOS were added to I-PrOH and then hydrochloric acid. The ITO substrate was treated with oxygen plasma at 10 W under 10 Pa for 10s and immersed in pure water, in order to produce a clean, hydrophilic surface of ITO. It was observed that amorphous nanomembranes contain sufficient acidic sites throughout the membrane interior and that the protons migrate through the membrane matrix.

Original languageEnglish
Pages (from-to)4387-4393
Number of pages7
JournalAdvanced Materials
Volume20
Issue number23
DOIs
Publication statusPublished - Dec 2 2008
Externally publishedYes

Fingerprint

Proton conductivity
Silicon Dioxide
Oxides
Gases
Metals
Silica
Membranes
Polymers
Silicates
Diffusion barriers
Hydrochloric Acid
Aluminosilicates
Polymethyl Methacrylate
Amorphous films
Hydrochloric acid
Sols
Purification
Protons
Ethanol
Oxygen

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Efficient proton conductivity of gas-tight nanomembranes of silica-based double oxides. / Aoki, Yoshitaka; Muto, Emi; Nakao, Aiko; Kunitake, Toyoki.

In: Advanced Materials, Vol. 20, No. 23, 02.12.2008, p. 4387-4393.

Research output: Contribution to journalArticle

Aoki, Yoshitaka ; Muto, Emi ; Nakao, Aiko ; Kunitake, Toyoki. / Efficient proton conductivity of gas-tight nanomembranes of silica-based double oxides. In: Advanced Materials. 2008 ; Vol. 20, No. 23. pp. 4387-4393.
@article{78ca1b78503c4f308de0c1ff067f0eb7,
title = "Efficient proton conductivity of gas-tight nanomembranes of silica-based double oxides",
abstract = "An experiment was conducted to report that protonic conduction is a common feature of amorphous films of many silica-based double oxides and that their sub-100-nm thick membranes can act as effective barriers against diffusion of H2 molecules. An aluminosilicate film of 100-nm thickness was prepared from a 100 mm mixed sol of AlCl3 and tetraethoxysilane (TEOS) with atomic ratio of Al/Si = 0.1/0.9 in ethanol. All of the metal alkoxides were used without further purification. Thin films of various metal silicates were prepared from mixed solutions of TEOS and individual metal alkoxides. Appropriate doses of TEOS were added to I-PrOH and then hydrochloric acid. The ITO substrate was treated with oxygen plasma at 10 W under 10 Pa for 10s and immersed in pure water, in order to produce a clean, hydrophilic surface of ITO. It was observed that amorphous nanomembranes contain sufficient acidic sites throughout the membrane interior and that the protons migrate through the membrane matrix.",
author = "Yoshitaka Aoki and Emi Muto and Aiko Nakao and Toyoki Kunitake",
year = "2008",
month = "12",
day = "2",
doi = "10.1002/adma.200703011",
language = "English",
volume = "20",
pages = "4387--4393",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "23",

}

TY - JOUR

T1 - Efficient proton conductivity of gas-tight nanomembranes of silica-based double oxides

AU - Aoki, Yoshitaka

AU - Muto, Emi

AU - Nakao, Aiko

AU - Kunitake, Toyoki

PY - 2008/12/2

Y1 - 2008/12/2

N2 - An experiment was conducted to report that protonic conduction is a common feature of amorphous films of many silica-based double oxides and that their sub-100-nm thick membranes can act as effective barriers against diffusion of H2 molecules. An aluminosilicate film of 100-nm thickness was prepared from a 100 mm mixed sol of AlCl3 and tetraethoxysilane (TEOS) with atomic ratio of Al/Si = 0.1/0.9 in ethanol. All of the metal alkoxides were used without further purification. Thin films of various metal silicates were prepared from mixed solutions of TEOS and individual metal alkoxides. Appropriate doses of TEOS were added to I-PrOH and then hydrochloric acid. The ITO substrate was treated with oxygen plasma at 10 W under 10 Pa for 10s and immersed in pure water, in order to produce a clean, hydrophilic surface of ITO. It was observed that amorphous nanomembranes contain sufficient acidic sites throughout the membrane interior and that the protons migrate through the membrane matrix.

AB - An experiment was conducted to report that protonic conduction is a common feature of amorphous films of many silica-based double oxides and that their sub-100-nm thick membranes can act as effective barriers against diffusion of H2 molecules. An aluminosilicate film of 100-nm thickness was prepared from a 100 mm mixed sol of AlCl3 and tetraethoxysilane (TEOS) with atomic ratio of Al/Si = 0.1/0.9 in ethanol. All of the metal alkoxides were used without further purification. Thin films of various metal silicates were prepared from mixed solutions of TEOS and individual metal alkoxides. Appropriate doses of TEOS were added to I-PrOH and then hydrochloric acid. The ITO substrate was treated with oxygen plasma at 10 W under 10 Pa for 10s and immersed in pure water, in order to produce a clean, hydrophilic surface of ITO. It was observed that amorphous nanomembranes contain sufficient acidic sites throughout the membrane interior and that the protons migrate through the membrane matrix.

UR - http://www.scopus.com/inward/record.url?scp=57349177496&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=57349177496&partnerID=8YFLogxK

U2 - 10.1002/adma.200703011

DO - 10.1002/adma.200703011

M3 - Article

AN - SCOPUS:57349177496

VL - 20

SP - 4387

EP - 4393

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 23

ER -