Electric evolution in sputter-deposited SncSnSi1-cSn alloy films

Kenji Sumiyama, Yuichiro Kurokawa, Hirotaka Yamada, Minoru Yamazaki, Takehiko Hihara

Research output: Contribution to journalArticlepeer-review

Abstract

SnCSnSi1-CSn alloy films (cSn: the chemical composition) have been prepared by rf sputter-deposition. X-ray diffraction measurement indicate that almost pure bct Sn and amorphous Si phases coexist for 0.28 ≤ cSn < 1.0. The electrical resistivity (p) measurement indicate that the alloy films are semiconducting above 10 K for cSn ≤ 0.47 and metallic for cSn ≥ 0.57, whereas they are superconducting below 4 K for cSn ≥ 0.38. When cSn is transformed to the volume fraction, vSn, the electrical conductivity, σ versus vSn plot shows clear inflection at around vSn = 0.41. This semiconductor to metal transition threshold (vp ≅ 0.41) is much larger than 0.16 for the 3 dimensional site percolation theory, 0.21∼0.25 for the partially coalesced Sn-core/Si-shell cluster assemblies and 0.33 for the effective medium theory, but smaller than 0.5 for the granular materials in which metal grains are heavily coated by small insulator grain layers. Temperature dependence of p also reveals a transition from a simple energy gap type conduction to a thermally assisted electron tunneling type one with increasing vSn.

Original languageEnglish
Pages (from-to)903-906
Number of pages4
JournalMaterials Transactions
Volume57
Issue number6
DOIs
Publication statusPublished - 2016
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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