Abstract
Poly(vinylidene fluoride-co-trifluoroethylene) [P(VDF/TrFE), VDF 75 mol %] ultrathin films of 10 nm thickness were prepared on gold coated silicon wafer substrates by a spin-coating method and their aggregation states were investigated by Fourier transform infrared reflection absorption spectroscopic measurement. It was found that P(VDF/TrFE) formed a ferroelectric phase even in a confined state such as an ultrathin film. The electric field was locally imposed on the ultrathin film through a gold coated cantilever tip. The change of dipole moment orientation of P(VDF/TrFE) was evaluated by measuring surface potential change, performed by scanning Maxwell stress microscopy (SMM). The SMM images revealed that the local dipole moment orientation of P(VDF/ TrFE) in ultrathin films could be changed by an application of electric field through an atomic force microscope tip.
| Original language | English |
|---|---|
| Pages (from-to) | 121-124 |
| Number of pages | 4 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 16 |
| Issue number | 1 |
| Publication status | Published - Jan 1 1998 |
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All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering
Cite this
Electric field induced structural change for poly(vinylidene fluoride-co-trifluoroethylene) ultrathin films studied by scanning Maxwell stress microscope. / Kajiyama, Tisato; Khuwattanasil, Noppadol; Takahara, Atsushi.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 16, No. 1, 01.01.1998, p. 121-124.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Electric field induced structural change for poly(vinylidene fluoride-co-trifluoroethylene) ultrathin films studied by scanning Maxwell stress microscope
AU - Kajiyama, Tisato
AU - Khuwattanasil, Noppadol
AU - Takahara, Atsushi
PY - 1998/1/1
Y1 - 1998/1/1
N2 - Poly(vinylidene fluoride-co-trifluoroethylene) [P(VDF/TrFE), VDF 75 mol %] ultrathin films of 10 nm thickness were prepared on gold coated silicon wafer substrates by a spin-coating method and their aggregation states were investigated by Fourier transform infrared reflection absorption spectroscopic measurement. It was found that P(VDF/TrFE) formed a ferroelectric phase even in a confined state such as an ultrathin film. The electric field was locally imposed on the ultrathin film through a gold coated cantilever tip. The change of dipole moment orientation of P(VDF/TrFE) was evaluated by measuring surface potential change, performed by scanning Maxwell stress microscopy (SMM). The SMM images revealed that the local dipole moment orientation of P(VDF/ TrFE) in ultrathin films could be changed by an application of electric field through an atomic force microscope tip.
AB - Poly(vinylidene fluoride-co-trifluoroethylene) [P(VDF/TrFE), VDF 75 mol %] ultrathin films of 10 nm thickness were prepared on gold coated silicon wafer substrates by a spin-coating method and their aggregation states were investigated by Fourier transform infrared reflection absorption spectroscopic measurement. It was found that P(VDF/TrFE) formed a ferroelectric phase even in a confined state such as an ultrathin film. The electric field was locally imposed on the ultrathin film through a gold coated cantilever tip. The change of dipole moment orientation of P(VDF/TrFE) was evaluated by measuring surface potential change, performed by scanning Maxwell stress microscopy (SMM). The SMM images revealed that the local dipole moment orientation of P(VDF/ TrFE) in ultrathin films could be changed by an application of electric field through an atomic force microscope tip.
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UR - http://www.scopus.com/inward/citedby.url?scp=0031682025&partnerID=8YFLogxK
M3 - Article
VL - 16
SP - 121
EP - 124
JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
SN - 0734-211X
IS - 1
ER -