Electrical contacts to nanocrystalline diamond films studied at high temperatures

Naotaka Shimoda, Yoshimine Kato, Kungen Tsutsui

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Electrical contacts of Ni, NiSi, Cu, Au, Al, and Ti electrodes to an n-type nanocrystalline diamond film are studied at temperatures between room temperature and 500 °C in a vacuum by the transmission line measurement. Direct current-voltage characteristics measured between pairs of electrodes on the film show almost straight lines, typical of ohmic contacts, for all kinds of electrode materials. The measured series resistance is divided into resistance of the film, resistance of the electrode, and the contact resistance between the electrode and film. The Ni electrode has the lowest contact resistance, which decreases from about 380 to 200 mΩ cm2 with temperature. The contact resistance accounts for a large portion of the total resistance at low temperatures. The results confirm that the contact resistance has a close relation with the work function of electrodes such that the larger the work function, the lower the contact resistance.

Original languageEnglish
Article number235706
JournalJournal of Applied Physics
Volume120
Issue number23
DOIs
Publication statusPublished - Dec 21 2016

Fingerprint

diamond films
electric contacts
contact resistance
electrodes
electrode materials
transmission lines
direct current
vacuum
temperature
electric potential
room temperature

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Electrical contacts to nanocrystalline diamond films studied at high temperatures. / Shimoda, Naotaka; Kato, Yoshimine; Tsutsui, Kungen.

In: Journal of Applied Physics, Vol. 120, No. 23, 235706, 21.12.2016.

Research output: Contribution to journalArticle

@article{25e67404f3b342e3ba63eefbf2b21d89,
title = "Electrical contacts to nanocrystalline diamond films studied at high temperatures",
abstract = "Electrical contacts of Ni, NiSi, Cu, Au, Al, and Ti electrodes to an n-type nanocrystalline diamond film are studied at temperatures between room temperature and 500 °C in a vacuum by the transmission line measurement. Direct current-voltage characteristics measured between pairs of electrodes on the film show almost straight lines, typical of ohmic contacts, for all kinds of electrode materials. The measured series resistance is divided into resistance of the film, resistance of the electrode, and the contact resistance between the electrode and film. The Ni electrode has the lowest contact resistance, which decreases from about 380 to 200 mΩ cm2 with temperature. The contact resistance accounts for a large portion of the total resistance at low temperatures. The results confirm that the contact resistance has a close relation with the work function of electrodes such that the larger the work function, the lower the contact resistance.",
author = "Naotaka Shimoda and Yoshimine Kato and Kungen Tsutsui",
year = "2016",
month = "12",
day = "21",
doi = "10.1063/1.4971960",
language = "English",
volume = "120",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "23",

}

TY - JOUR

T1 - Electrical contacts to nanocrystalline diamond films studied at high temperatures

AU - Shimoda, Naotaka

AU - Kato, Yoshimine

AU - Tsutsui, Kungen

PY - 2016/12/21

Y1 - 2016/12/21

N2 - Electrical contacts of Ni, NiSi, Cu, Au, Al, and Ti electrodes to an n-type nanocrystalline diamond film are studied at temperatures between room temperature and 500 °C in a vacuum by the transmission line measurement. Direct current-voltage characteristics measured between pairs of electrodes on the film show almost straight lines, typical of ohmic contacts, for all kinds of electrode materials. The measured series resistance is divided into resistance of the film, resistance of the electrode, and the contact resistance between the electrode and film. The Ni electrode has the lowest contact resistance, which decreases from about 380 to 200 mΩ cm2 with temperature. The contact resistance accounts for a large portion of the total resistance at low temperatures. The results confirm that the contact resistance has a close relation with the work function of electrodes such that the larger the work function, the lower the contact resistance.

AB - Electrical contacts of Ni, NiSi, Cu, Au, Al, and Ti electrodes to an n-type nanocrystalline diamond film are studied at temperatures between room temperature and 500 °C in a vacuum by the transmission line measurement. Direct current-voltage characteristics measured between pairs of electrodes on the film show almost straight lines, typical of ohmic contacts, for all kinds of electrode materials. The measured series resistance is divided into resistance of the film, resistance of the electrode, and the contact resistance between the electrode and film. The Ni electrode has the lowest contact resistance, which decreases from about 380 to 200 mΩ cm2 with temperature. The contact resistance accounts for a large portion of the total resistance at low temperatures. The results confirm that the contact resistance has a close relation with the work function of electrodes such that the larger the work function, the lower the contact resistance.

UR - http://www.scopus.com/inward/record.url?scp=85006978497&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85006978497&partnerID=8YFLogxK

U2 - 10.1063/1.4971960

DO - 10.1063/1.4971960

M3 - Article

AN - SCOPUS:85006978497

VL - 120

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 23

M1 - 235706

ER -