The carrier concentration and mobility of intrinsic holes in poly-Ge films grown by solid-phase crystallization (SPC) were investigated. The two-step SPC method, consisting of low-temperature annealing (425 °C) to obtain large grains and subsequent high-temperature annealing (500 °C) to decrease defects, is proposed. The hole concentration remarkably decreased from 1 × 1018 to 5 × 1017cm-3 with keeping a high-mobility (140 cm2/Vs) after post-annealing.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry