Electrochemical metal deposition on silicon

Yukio H. Ogata, Katsutoshi Kobayashi, Munekazu Motoyama

Research output: Contribution to journalArticlepeer-review

88 Citations (Scopus)

Abstract

Electrochemical metal deposition is utilized to fabricate micro- and nano-structures. A variety of the structures have been achieved in metal patterning and structuring and also in the structure formation of silicon itself. The controlling factors and conditions of the size, morphology and distribution have been investigated. The importance of metal deposition by displacement reaction should be recognized.

Original languageEnglish
Pages (from-to)163-172
Number of pages10
JournalCurrent Opinion in Solid State and Materials Science
Volume10
Issue number3-4
DOIs
Publication statusPublished - Jun 2006
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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