Electrode metal dependence of leakage current characteristics of epitaxial BaTiO3 films on p- and n-type electrodes

Motochika Okano, Daisuke Sawamura, Yukio Watanabe

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

BaTiO3 (BTO) films are grown on the bottom electrodes of Nb-doped SrTiO3 (STON) and La2CuO4. The current through the BTO films exhibits diode properties having a reproducible hysteresis at a forward bias with polarity determined by the bottom electrode. In BTO/La2CuO4 the current intensity is almost independent of metal top-electrode materials, which is explicable by regarding BTO/La2CuO4 as a pn junction [p: hole earner, n: electron carrier]. The current through BTO/STON is limited by the work functions of the metal and BTO, suggesting that it is suppressed by an electrode metal with a high work function, e.g., Pt, in an n-type ferroelectric such as BTO. In a p-type ferroelectric such as PLZT, it is suppressed by an electrode metal with a low work function. The relaxation current, the large leakage current in epitaxial ferroelectric films, and the effect of the ferroelectric carrier type on fatigue are discussed.

Original languageEnglish
Pages (from-to)5101-5103
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume37
Issue number9 PART B
DOIs
Publication statusPublished - Sep 1998
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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