Electrodeposition of metallic molybdenum films in ZnCl2-NaCl-KCl-MoCl3 systems at 250 °C

Hironori Nakajima, Toshiyuki Nohira, Rika Hagiwara

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17 Citations (Scopus)

Abstract

Molybdenum metal film has been electrodeposited in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing MoCl3 at 250 °C. In this melt, a dense film was obtained by potentiostatic electrolysis at 0.15 V versus Zn(II)/Zn for 3 h. However, the film had a thickness of smaller than 0.5 μm and was not adhesive. On the other hand, addition of 4 mol% of KF to the melt led to larger cathodic current in cyclic voltammogram, and gave a dense, adhesive and thicker metal film of ca. 3 μm thickness in the same electrolysis condition as above. The present process is promising as a new method for molybdenum coating at low temperatures.

Original languageEnglish
Pages (from-to)3776-3780
Number of pages5
JournalElectrochimica Acta
Volume51
Issue number18
DOIs
Publication statusPublished - May 5 2006
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Electrochemistry

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