Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C

Hironori Nakajima, Toshiyuki Nohira, Rika Hagiwara

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25 Citations (Scopus)

Abstract

Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

Original languageEnglish
Pages (from-to)C91-C94
JournalElectrochemical and Solid-State Letters
Volume8
Issue number7
DOIs
Publication statusPublished - Aug 16 2005
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering

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