Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C

Hironori Nakajima, Toshiyuki Nohira, Rika Hagiwara

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

Original languageEnglish
Pages (from-to)C91-C94
JournalElectrochemical and Solid-State Letters
Volume8
Issue number7
DOIs
Publication statusPublished - Aug 16 2005
Externally publishedYes

Fingerprint

Tungsten
electrolysis
Electrolysis
Electrodeposition
electrodeposition
tungsten
Deposits
deposits
Metals
metals

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering

Cite this

Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C. / Nakajima, Hironori; Nohira, Toshiyuki; Hagiwara, Rika.

In: Electrochemical and Solid-State Letters, Vol. 8, No. 7, 16.08.2005, p. C91-C94.

Research output: Contribution to journalArticle

@article{d47571b1a0c44da491682abc991cc61a,
title = "Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C",
abstract = "Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol {\%} of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.",
author = "Hironori Nakajima and Toshiyuki Nohira and Rika Hagiwara",
year = "2005",
month = "8",
day = "16",
doi = "10.1149/1.1921130",
language = "English",
volume = "8",
pages = "C91--C94",
journal = "Electrochemical and Solid-State Letters",
issn = "1099-0062",
publisher = "Electrochemical Society, Inc.",
number = "7",

}

TY - JOUR

T1 - Electrodeposition of metallic tungsten in ZnCl2-NaCl-KCl- WCl4 melt at 250°C

AU - Nakajima, Hironori

AU - Nohira, Toshiyuki

AU - Hagiwara, Rika

PY - 2005/8/16

Y1 - 2005/8/16

N2 - Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

AB - Metallic tungsten film has been obtained by potentiostatic electrolysis in ZnCl2-NaCl-KCl (0.60:0.20:0.20, in mole fraction) melt containing WCl4 at 250°C. The deposit obtained after the electrolysis at 0.02 V vs. Zn(II)/Zn for 3 h was ca. 0.5 μm thick and the surface was not smooth. On the other hand, addition of 4 mol % of KF to the melt gave a smooth metal deposit ca. 0.5 μm thick in the same condition as above.

UR - http://www.scopus.com/inward/record.url?scp=23244460017&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=23244460017&partnerID=8YFLogxK

U2 - 10.1149/1.1921130

DO - 10.1149/1.1921130

M3 - Article

AN - SCOPUS:23244460017

VL - 8

SP - C91-C94

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

SN - 1099-0062

IS - 7

ER -