Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface

Toshikazu Arai; Tomoyuki Mitsui; Hideki Yayama

doi:10.1063/1.2354615

Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface

Toshikazu Arai, Tomoyuki Mitsui, Hideki Yayama

Division for Experimental Natural Science

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid ⁴He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient K _e is strongly temperature dependent. We observe that, as the temperature is lowered, K_e increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE.

Original language	English
Title of host publication	LOW TEMPERATURE PHYSICS
Subtitle of host publication	24th International Conference on Low Temperature Physics - LT24
Pages	83-84
Number of pages	2
DOIs	https://doi.org/10.1063/1.2354615
Publication status	Published - Dec 1 2006
Event	LOW TEMPERATURE PHYSICS: 24th International Conference on Low Temperature Physics - LT24 - Orlando, FL, United States Duration: Aug 10 2006 → Oct 17 2006

Publication series

Name	AIP Conference Proceedings
Volume	850
ISSN (Print)	0094-243X
ISSN (Electronic)	1551-7616

Other

Other	LOW TEMPERATURE PHYSICS: 24th International Conference on Low Temperature Physics - LT24
Country	United States
City	Orlando, FL
Period	8/10/06 → 10/17/06

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All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)

Cite this

Arai, T., Mitsui, T., & Yayama, H. (2006). Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface. In LOW TEMPERATURE PHYSICS: 24th International Conference on Low Temperature Physics - LT24 (pp. 83-84). (AIP Conference Proceedings; Vol. 850). https://doi.org/10.1063/1.2354615

Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface. / Arai, Toshikazu; Mitsui, Tomoyuki; Yayama, Hideki.

LOW TEMPERATURE PHYSICS: 24th International Conference on Low Temperature Physics - LT24. 2006. p. 83-84 (AIP Conference Proceedings; Vol. 850).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Arai, T, Mitsui, T & Yayama, H 2006, Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface. in LOW TEMPERATURE PHYSICS: 24th International Conference on Low Temperature Physics - LT24. AIP Conference Proceedings, vol. 850, pp. 83-84, LOW TEMPERATURE PHYSICS: 24th International Conference on Low Temperature Physics - LT24, Orlando, FL, United States, 8/10/06. https://doi.org/10.1063/1.2354615

@inproceedings{0a89b16e5ece411fbfa61a8b4277ddce,

title = "Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface",

abstract = "We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid 4He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient K e is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE.",

author = "Toshikazu Arai and Tomoyuki Mitsui and Hideki Yayama",

year = "2006",

month = "12",

day = "1",

doi = "10.1063/1.2354615",

language = "English",

isbn = "0735403473",

series = "AIP Conference Proceedings",

pages = "83--84",

booktitle = "LOW TEMPERATURE PHYSICS",

}

TY - GEN

T1 - Electron attachment reaction rates in 2D atomic hydrogen-electron mixed system on liquid helium surface

AU - Arai, Toshikazu

AU - Mitsui, Tomoyuki

AU - Yayama, Hideki

PY - 2006/12/1

Y1 - 2006/12/1

N2 - We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid 4He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient K e is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE.

AB - We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid 4He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient K e is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE.

UR - http://www.scopus.com/inward/record.url?scp=33947498652&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33947498652&partnerID=8YFLogxK

U2 - 10.1063/1.2354615

DO - 10.1063/1.2354615

M3 - Conference contribution

AN - SCOPUS:33947498652

SN - 0735403473

SN - 9780735403475

T3 - AIP Conference Proceedings

SP - 83

EP - 84

BT - LOW TEMPERATURE PHYSICS

ER -

Access to Document

10.1063/1.2354615