ELECTRON-BEAM EXPOSURE EPITAXY (EBE-EPITAXY) FOR THE FORMATION OF SOI-GaAs films on CaF//2/Si(111) STRUCTURES.

Hee Chul Lee, Tanemasa Asano, Hiroshi Ishiwara, Seigo Kanemaru, Seijiro Furukawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

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Engineering & Materials Science