Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma

Naho Itagaki, S. Iwata, K. Muta, A. Yonesu, S. Kawakami, N. Ishii, Y. Kawai

Research output: Contribution to journalConference article

46 Citations (Scopus)

Abstract

The nitrogen molecular dissociation level in 915 MHz ECR plasma was evaluated as a function of the electron temperature by optical emission spectroscopy. The intensity ratio of N line to N2 line, which provides information on changes in the degree of dissociation of nitrogen molecules, was found to increase monotonously from 0.01 to 0.07 with increasing the electron temperature from 2 to 7 eV. Furthermore, it was confirmed that increasing the electron density and/or the introduction of argon in the discharge significantly enhanced the nitrogen molecular dissociation level.

Original languageEnglish
Pages (from-to)259-263
Number of pages5
JournalThin Solid Films
Volume435
Issue number1-2
DOIs
Publication statusPublished - Jul 1 2003
EventProccedings of the Joint International Plasma Symposium - Jeju Island, Korea, Republic of
Duration: Jul 1 2002Jul 4 2002

Fingerprint

Electron temperature
Nitrogen
dissociation
electron energy
Plasmas
nitrogen
temperature dependence
Optical emission spectroscopy
Argon
optical emission spectroscopy
Carrier concentration
argon
Molecules
molecules

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Itagaki, N., Iwata, S., Muta, K., Yonesu, A., Kawakami, S., Ishii, N., & Kawai, Y. (2003). Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma. Thin Solid Films, 435(1-2), 259-263. https://doi.org/10.1016/S0040-6090(03)00395-X

Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma. / Itagaki, Naho; Iwata, S.; Muta, K.; Yonesu, A.; Kawakami, S.; Ishii, N.; Kawai, Y.

In: Thin Solid Films, Vol. 435, No. 1-2, 01.07.2003, p. 259-263.

Research output: Contribution to journalConference article

Itagaki, N, Iwata, S, Muta, K, Yonesu, A, Kawakami, S, Ishii, N & Kawai, Y 2003, 'Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma', Thin Solid Films, vol. 435, no. 1-2, pp. 259-263. https://doi.org/10.1016/S0040-6090(03)00395-X
Itagaki, Naho ; Iwata, S. ; Muta, K. ; Yonesu, A. ; Kawakami, S. ; Ishii, N. ; Kawai, Y. / Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma. In: Thin Solid Films. 2003 ; Vol. 435, No. 1-2. pp. 259-263.
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AU - Kawai, Y.

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AB - The nitrogen molecular dissociation level in 915 MHz ECR plasma was evaluated as a function of the electron temperature by optical emission spectroscopy. The intensity ratio of N line to N2 line, which provides information on changes in the degree of dissociation of nitrogen molecules, was found to increase monotonously from 0.01 to 0.07 with increasing the electron temperature from 2 to 7 eV. Furthermore, it was confirmed that increasing the electron density and/or the introduction of argon in the discharge significantly enhanced the nitrogen molecular dissociation level.

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