TY - JOUR
T1 - Element sensitive atom beam etching based on projectile mass
AU - Watanabe, Y.
AU - Tanamura, M.
N1 - Funding Information:
Authors acknowledge H. Kida and KAKENHI’s Nos. 12134208, 13640334, and 14038235, and the support from the Zairyo Kagaku Foundation.
Copyright:
Copyright 2019 Elsevier B.V., All rights reserved.
PY - 2003/2/28
Y1 - 2003/2/28
N2 - A new approach of ion/atom beam etching is proposed, which utilizes the projectile mass dependence of the sputtering process. As a model experiment, we etch YBa 2 Cu 3 O 7-δ films using inert gases having different masses. Various etching characteristics are found to depend evidently on the mass of the gases. Substantial improvements such as 2.5-fold increase of the etching selectivity and the reduction of the etching damage of the etched area are demonstrated by using Kr. A primitive semi-empirical extension of Sigmund theory is proposed, which explains the results indeed as a mass effect and suggests the directions of further improvements. The results show a new important factor in plasma and ion/atom beam etching, which can be useful for realizing artificial structures of metal oxides.
AB - A new approach of ion/atom beam etching is proposed, which utilizes the projectile mass dependence of the sputtering process. As a model experiment, we etch YBa 2 Cu 3 O 7-δ films using inert gases having different masses. Various etching characteristics are found to depend evidently on the mass of the gases. Substantial improvements such as 2.5-fold increase of the etching selectivity and the reduction of the etching damage of the etched area are demonstrated by using Kr. A primitive semi-empirical extension of Sigmund theory is proposed, which explains the results indeed as a mass effect and suggests the directions of further improvements. The results show a new important factor in plasma and ion/atom beam etching, which can be useful for realizing artificial structures of metal oxides.
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U2 - 10.1016/S0169-4332(02)01468-X
DO - 10.1016/S0169-4332(02)01468-X
M3 - Article
AN - SCOPUS:0037470370
VL - 207
SP - 287
EP - 294
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
IS - 1-4
ER -