Emission characteristics of extreme ultraviolet radiation from CO 2 laser-produced xenon plasma

Hiroki Tanaka, Koji Akinaga, Akihiko Takahashi, Tatsuo Okada

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33 Citations (Scopus)

Abstract

We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.

Original languageEnglish
Pages (from-to)L585-L587
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume43
Issue number4 B
DOIs
Publication statusPublished - Apr 15 2004

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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