Emission characteristics of extreme ultraviolet radiation from CO 2 laser-produced xenon plasma

Hiroki Tanaka; Koji Akinaga; Akihiko Takahashi; Tatsuo Okada

doi:10.1143/jjap.43.l585

Emission characteristics of extreme ultraviolet radiation from CO ₂ laser-produced xenon plasma

Hiroki Tanaka, Koji Akinaga, Akihiko Takahashi, Tatsuo Okada

Division of medical Quantum Science

Research output: Contribution to journal › Article › peer-review

36 Citations (Scopus)

Abstract

We propose a CO₂ laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO₂ laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO₂ laser produced plasma.

Original language	English
Pages (from-to)	L585-L587
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	43
Issue number	4 B
DOIs	https://doi.org/10.1143/jjap.43.l585
Publication status	Published - Apr 15 2004

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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@article{9e669aaffb1644a89164fab83ba1c7ef,

title = "Emission characteristics of extreme ultraviolet radiation from CO 2 laser-produced xenon plasma",

abstract = "We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.",

author = "Hiroki Tanaka and Koji Akinaga and Akihiko Takahashi and Tatsuo Okada",

year = "2004",

month = apr,

day = "15",

doi = "10.1143/jjap.43.l585",

language = "English",

volume = "43",

pages = "L585--L587",

journal = "Japanese Journal of Applied Physics, Part 2: Letters",

issn = "0021-4922",

publisher = "IOP Publishing Ltd.",

number = "4 B",

}

TY - JOUR

T1 - Emission characteristics of extreme ultraviolet radiation from CO 2 laser-produced xenon plasma

AU - Tanaka, Hiroki

AU - Akinaga, Koji

AU - Takahashi, Akihiko

AU - Okada, Tatsuo

PY - 2004/4/15

Y1 - 2004/4/15

N2 - We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.

AB - We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.

UR - http://www.scopus.com/inward/record.url?scp=3042708428&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3042708428&partnerID=8YFLogxK

U2 - 10.1143/jjap.43.l585

DO - 10.1143/jjap.43.l585

M3 - Article

AN - SCOPUS:3042708428

SN - 0021-4922

VL - 43

SP - L585-L587

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

IS - 4 B

ER -

Emission characteristics of extreme ultraviolet radiation from CO ₂ laser-produced xenon plasma

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