Enhanced degradation of gate oxide in negative-gas plasma during reactive ion etching

Kiyoshi Arita, Hirotaka Takihara, Tanemasa Asano

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Fingerprint Dive into the research topics of 'Enhanced degradation of gate oxide in negative-gas plasma during reactive ion etching'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy