Enhanced deposition of cubic boron nitride films on roughened silicon and tungsten carbide-cobalt surfaces

Kungen Tsutsui, T. Hori, S. Matsumoto

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

We report the influence of substrate surface roughness on cubic boron nitride (cBN) film deposition under low-energy ion bombardment in an inductively coupled plasma. Silicon and cemented tungsten carbide-cobalt (WC-Co) surfaces are roughened by low-energy ion-assisted etching in a hydrogen plasma, followed by deposition in a fluorine-containing plasma. Infrared absorption coefficients are measured to be 22,000 cm-1 and 17,000 cm-1 for sp 2-bonded BN and cBN phases, respectively, for our films. For the silicon substrates, the film growth rate and the cBN content in the film increase with increasing the surface roughness, while the amount of sp 2BN phase in the film shows only a small increase. A larger surface roughness of the substrate results in a smaller contact angle of water, indicating that a higher surface free energy of the substrate contributes to enhancing growth of the cBN film. For the WC-Co substrates, the film growth rate and the cBN content in the film increase similarly by roughening the surface.

Original languageEnglish
Pages (from-to)1817-1820
Number of pages4
JournalThin Solid Films
Volume519
Issue number6
DOIs
Publication statusPublished - Jan 3 2011

Fingerprint

Cubic boron nitride
tungsten carbides
Tungsten carbide
boron nitrides
Cobalt
Silicon carbide
silicon carbides
cobalt
Substrates
Surface roughness
Silicon
Film growth
surface roughness
Plasmas
Fluorine
Infrared absorption
Inductively coupled plasma
Ion bombardment
Free energy
Contact angle

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Enhanced deposition of cubic boron nitride films on roughened silicon and tungsten carbide-cobalt surfaces. / Tsutsui, Kungen; Hori, T.; Matsumoto, S.

In: Thin Solid Films, Vol. 519, No. 6, 03.01.2011, p. 1817-1820.

Research output: Contribution to journalArticle

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