Enhanced interlafer coupling and magnetoresistance ratio in Fe 3Si/FeSi2 superlattlces

Kaoru Takeda, Tsuyoshi Yoshitake, Yoshiki Sakamoto, Tetsuya Ogawa, Daisuke Hara, Masaru Itakura, Noriyuki Kuwano, Toshinori Kajiwara, Kunihito Nagayama

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

[Fe3Si/FeSi2]20 superlattices were prepared on Si(111) at an elevated substrate temperature of 300°C, and the magnetoresistance ratio and interlayer coupling strengths were enhanced by approximately 100 and 34%, respectively, as compared to those of superlattices deposited at room temperature. While the elevated substrate temperature degraded the interface sharpness, the crystalline orientation and the crystallinity of the Fe3Si layers were apparently enhanced. The latters strongly influence on the interlayer coupling and the magnetoresistance ratio. This implies that quantum well states are tightly formed under the well-ordered crystalline planes, and the spin diffusion lengths are improved due to the enhanced crystallinity.

Original languageEnglish
Article number021302
JournalApplied Physics Express
Volume1
Issue number2
DOIs
Publication statusPublished - Feb 2008

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Enhanced interlafer coupling and magnetoresistance ratio in Fe <sub>3</sub>Si/FeSi<sub>2</sub> superlattlces'. Together they form a unique fingerprint.

Cite this