Enhanced interlafer coupling and magnetoresistance ratio in Fe 3Si/FeSi2 superlattlces

Kaoru Takeda, Tsuyoshi Yoshitake, Yoshiki Sakamoto, Tetsuya Ogawa, Daisuke Hara, Masaru Itakura, Noriyuki Kuwano, Toshinori Kajiwara, Kunihito Nagayama

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

[Fe3Si/FeSi2]20 superlattices were prepared on Si(111) at an elevated substrate temperature of 300°C, and the magnetoresistance ratio and interlayer coupling strengths were enhanced by approximately 100 and 34%, respectively, as compared to those of superlattices deposited at room temperature. While the elevated substrate temperature degraded the interface sharpness, the crystalline orientation and the crystallinity of the Fe3Si layers were apparently enhanced. The latters strongly influence on the interlayer coupling and the magnetoresistance ratio. This implies that quantum well states are tightly formed under the well-ordered crystalline planes, and the spin diffusion lengths are improved due to the enhanced crystallinity.

Original languageEnglish
Article number021302
JournalApplied Physics Express
Volume1
Issue number2
DOIs
Publication statusPublished - Feb 1 2008

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Magnetoresistance
superlattices
interlayers
crystallinity
Superlattices
sharpness
diffusion length
Crystalline materials
quantum wells
Substrates
Crystal orientation
Temperature
Semiconductor quantum wells
temperature
room temperature

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Enhanced interlafer coupling and magnetoresistance ratio in Fe 3Si/FeSi2 superlattlces. / Takeda, Kaoru; Yoshitake, Tsuyoshi; Sakamoto, Yoshiki; Ogawa, Tetsuya; Hara, Daisuke; Itakura, Masaru; Kuwano, Noriyuki; Kajiwara, Toshinori; Nagayama, Kunihito.

In: Applied Physics Express, Vol. 1, No. 2, 021302, 01.02.2008.

Research output: Contribution to journalArticle

Takeda, K, Yoshitake, T, Sakamoto, Y, Ogawa, T, Hara, D, Itakura, M, Kuwano, N, Kajiwara, T & Nagayama, K 2008, 'Enhanced interlafer coupling and magnetoresistance ratio in Fe 3Si/FeSi2 superlattlces', Applied Physics Express, vol. 1, no. 2, 021302. https://doi.org/10.1143/APEX.1.021302
Takeda, Kaoru ; Yoshitake, Tsuyoshi ; Sakamoto, Yoshiki ; Ogawa, Tetsuya ; Hara, Daisuke ; Itakura, Masaru ; Kuwano, Noriyuki ; Kajiwara, Toshinori ; Nagayama, Kunihito. / Enhanced interlafer coupling and magnetoresistance ratio in Fe 3Si/FeSi2 superlattlces. In: Applied Physics Express. 2008 ; Vol. 1, No. 2.
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AU - Ogawa, Tetsuya

AU - Hara, Daisuke

AU - Itakura, Masaru

AU - Kuwano, Noriyuki

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